JPS5340634B2 - - Google Patents
Info
- Publication number
- JPS5340634B2 JPS5340634B2 JP1012976A JP1012976A JPS5340634B2 JP S5340634 B2 JPS5340634 B2 JP S5340634B2 JP 1012976 A JP1012976 A JP 1012976A JP 1012976 A JP1012976 A JP 1012976A JP S5340634 B2 JPS5340634 B2 JP S5340634B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1012976A JPS5293493A (en) | 1976-02-02 | 1976-02-02 | Preparation of macromolecular materials for electron beam resists |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1012976A JPS5293493A (en) | 1976-02-02 | 1976-02-02 | Preparation of macromolecular materials for electron beam resists |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5293493A JPS5293493A (en) | 1977-08-05 |
JPS5340634B2 true JPS5340634B2 (en:Method) | 1978-10-28 |
Family
ID=11741665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1012976A Granted JPS5293493A (en) | 1976-02-02 | 1976-02-02 | Preparation of macromolecular materials for electron beam resists |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5293493A (en:Method) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55105244A (en) * | 1979-02-06 | 1980-08-12 | Victor Co Of Japan Ltd | Electron beam resist |
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1976
- 1976-02-02 JP JP1012976A patent/JPS5293493A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5293493A (en) | 1977-08-05 |