JPS5339442B2 - - Google Patents

Info

Publication number
JPS5339442B2
JPS5339442B2 JP2173472A JP2173472A JPS5339442B2 JP S5339442 B2 JPS5339442 B2 JP S5339442B2 JP 2173472 A JP2173472 A JP 2173472A JP 2173472 A JP2173472 A JP 2173472A JP S5339442 B2 JPS5339442 B2 JP S5339442B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2173472A
Other languages
Japanese (ja)
Other versions
JPS4889918A (OSRAM
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2173472A priority Critical patent/JPS5339442B2/ja
Priority to US336345A priority patent/US3925179A/en
Priority to FR7307369A priority patent/FR2174252B1/fr
Priority to DE2310284A priority patent/DE2310284C3/de
Priority to GB999573A priority patent/GB1404076A/en
Priority to NL7302981.A priority patent/NL159147B/xx
Publication of JPS4889918A publication Critical patent/JPS4889918A/ja
Publication of JPS5339442B2 publication Critical patent/JPS5339442B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/02—Electrophoretic coating characterised by the process with inorganic material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/0217—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Surface Treatment Of Glass (AREA)
JP2173472A 1972-03-02 1972-03-02 Expired JPS5339442B2 (OSRAM)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2173472A JPS5339442B2 (OSRAM) 1972-03-02 1972-03-02
US336345A US3925179A (en) 1972-03-02 1973-02-27 Method of electrically depositing glass particles on objective body
FR7307369A FR2174252B1 (OSRAM) 1972-03-02 1973-03-01
DE2310284A DE2310284C3 (de) 1972-03-02 1973-03-01 Verfahren zum elektrischem Aufbringen von Glasteilchen auf einen Körper aus Halbleitermaterial
GB999573A GB1404076A (en) 1972-03-02 1973-03-01 Method of electrically depositing glass particles
NL7302981.A NL159147B (nl) 1972-03-02 1973-03-02 Werkwijze voor het elektroforetisch afzetten van glasdeeltjes op een halfgeleiderlichaam.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2173472A JPS5339442B2 (OSRAM) 1972-03-02 1972-03-02

Publications (2)

Publication Number Publication Date
JPS4889918A JPS4889918A (OSRAM) 1973-11-24
JPS5339442B2 true JPS5339442B2 (OSRAM) 1978-10-21

Family

ID=12063290

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2173472A Expired JPS5339442B2 (OSRAM) 1972-03-02 1972-03-02

Country Status (6)

Country Link
US (1) US3925179A (OSRAM)
JP (1) JPS5339442B2 (OSRAM)
DE (1) DE2310284C3 (OSRAM)
FR (1) FR2174252B1 (OSRAM)
GB (1) GB1404076A (OSRAM)
NL (1) NL159147B (OSRAM)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS551703B2 (OSRAM) * 1972-07-07 1980-01-16
US3895127A (en) * 1974-04-19 1975-07-15 Rca Corp Method of selectively depositing glass on semiconductor devices
IT1099126B (it) * 1978-09-21 1985-09-18 Ates Componenti Elettron Bagno per la deposizione mediante elettroforesi di un rivestimento isolante su un corpo semiconduttore
US4595473A (en) * 1984-08-28 1986-06-17 Trw Inc. Forging lubricant
DE19520458A1 (de) * 1995-06-03 1996-12-05 Forschungszentrum Juelich Gmbh Vorrichtung zur elektrophoretischen Beschichtung von Substraten

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE666930C (de) * 1936-09-26 1938-11-01 Philips Patentverwaltung Verfahren zum Herstellen einer Deckschicht
US2321439A (en) * 1936-09-26 1943-06-08 Hartford Nat Bank & Trust Co Method of making vitreous coated bodies
US3163592A (en) * 1960-09-01 1964-12-29 Sylvania Electric Prod Process for electrophoretically applying a coating of phosphor
US3280019A (en) * 1963-07-03 1966-10-18 Ibm Method of selectively coating semiconductor chips
US3379625A (en) * 1964-03-30 1968-04-23 Gen Electric Semiconductor testing
US3642597A (en) * 1970-03-20 1972-02-15 Gen Electric Semiconductor passivating process

Also Published As

Publication number Publication date
DE2310284B2 (de) 1978-05-24
DE2310284C3 (de) 1979-01-18
DE2310284A1 (de) 1973-09-20
GB1404076A (en) 1975-08-28
USB336345I5 (OSRAM) 1975-01-28
US3925179A (en) 1975-12-09
NL7302981A (OSRAM) 1973-09-04
FR2174252A1 (OSRAM) 1973-10-12
FR2174252B1 (OSRAM) 1976-05-21
NL159147B (nl) 1979-01-15
JPS4889918A (OSRAM) 1973-11-24

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