JPS5338193B2 - - Google Patents

Info

Publication number
JPS5338193B2
JPS5338193B2 JP12849676A JP12849676A JPS5338193B2 JP S5338193 B2 JPS5338193 B2 JP S5338193B2 JP 12849676 A JP12849676 A JP 12849676A JP 12849676 A JP12849676 A JP 12849676A JP S5338193 B2 JPS5338193 B2 JP S5338193B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12849676A
Other languages
Japanese (ja)
Other versions
JPS5352593A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12849676A priority Critical patent/JPS5352593A/ja
Publication of JPS5352593A publication Critical patent/JPS5352593A/ja
Publication of JPS5338193B2 publication Critical patent/JPS5338193B2/ja
Granted legal-status Critical Current

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  • Processes Of Treating Macromolecular Substances (AREA)
JP12849676A 1976-10-26 1976-10-26 Electron rays-sensitive polymer Granted JPS5352593A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12849676A JPS5352593A (en) 1976-10-26 1976-10-26 Electron rays-sensitive polymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12849676A JPS5352593A (en) 1976-10-26 1976-10-26 Electron rays-sensitive polymer

Publications (2)

Publication Number Publication Date
JPS5352593A JPS5352593A (en) 1978-05-13
JPS5338193B2 true JPS5338193B2 (xx) 1978-10-13

Family

ID=14986171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12849676A Granted JPS5352593A (en) 1976-10-26 1976-10-26 Electron rays-sensitive polymer

Country Status (1)

Country Link
JP (1) JPS5352593A (xx)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0007976A1 (en) * 1978-05-22 1980-02-20 Western Electric Company, Incorporated Lithographic resist and device processing utilizing same
JPS5795103U (xx) * 1980-12-02 1982-06-11
JPH0345683Y2 (xx) * 1986-11-17 1991-09-26

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5983157A (ja) * 1982-09-28 1984-05-14 エクソン・リサ−チ・アンド・エンジニアリング・カンパニ− ポジ型重合体レジストの感度及びコントラストを増大させる方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915372A (xx) * 1972-03-24 1974-02-09
JPS511971A (en) * 1974-06-25 1976-01-09 Meidensha Electric Mfg Co Ltd Kaiheikino sosasochi
US3984582A (en) * 1975-06-30 1976-10-05 Ibm Method for preparing positive resist image

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915372A (xx) * 1972-03-24 1974-02-09
JPS511971A (en) * 1974-06-25 1976-01-09 Meidensha Electric Mfg Co Ltd Kaiheikino sosasochi
US3984582A (en) * 1975-06-30 1976-10-05 Ibm Method for preparing positive resist image

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0007976A1 (en) * 1978-05-22 1980-02-20 Western Electric Company, Incorporated Lithographic resist and device processing utilizing same
JPS5795103U (xx) * 1980-12-02 1982-06-11
JPH0345683Y2 (xx) * 1986-11-17 1991-09-26

Also Published As

Publication number Publication date
JPS5352593A (en) 1978-05-13

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