JPS5336334B2 - - Google Patents

Info

Publication number
JPS5336334B2
JPS5336334B2 JP11942372A JP11942372A JPS5336334B2 JP S5336334 B2 JPS5336334 B2 JP S5336334B2 JP 11942372 A JP11942372 A JP 11942372A JP 11942372 A JP11942372 A JP 11942372A JP S5336334 B2 JPS5336334 B2 JP S5336334B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11942372A
Other languages
Japanese (ja)
Other versions
JPS4918040A (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/244,393 external-priority patent/US3982824A/en
Application filed filed Critical
Publication of JPS4918040A publication Critical patent/JPS4918040A/ja
Publication of JPS5336334B2 publication Critical patent/JPS5336334B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70233Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0621Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0626Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors
    • G02B17/0642Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Lenses (AREA)
JP11942372A 1972-04-17 1972-11-30 Expired JPS5336334B2 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/244,393 US3982824A (en) 1971-12-01 1972-04-17 Catoptric lens arrangement

Publications (2)

Publication Number Publication Date
JPS4918040A JPS4918040A (https=) 1974-02-18
JPS5336334B2 true JPS5336334B2 (https=) 1978-10-02

Family

ID=22922552

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11942372A Expired JPS5336334B2 (https=) 1972-04-17 1972-11-30

Country Status (3)

Country Link
JP (1) JPS5336334B2 (https=)
CA (1) CA1002800A (https=)
FR (1) FR2180636B1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59197007A (ja) * 1983-04-22 1984-11-08 Yasuto Ozaki レ−ザ光により投光線を得る装置
US7720197B2 (en) * 2008-05-30 2010-05-18 Rigaku Innovative Technologies, Inc. High intensity x-ray beam system

Also Published As

Publication number Publication date
JPS4918040A (https=) 1974-02-18
FR2180636A1 (https=) 1973-11-30
CA1002800A (en) 1977-01-04
FR2180636B1 (https=) 1976-10-29

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