JPS5334464A - Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor - Google Patents

Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Info

Publication number
JPS5334464A
JPS5334464A JP10854676A JP10854676A JPS5334464A JP S5334464 A JPS5334464 A JP S5334464A JP 10854676 A JP10854676 A JP 10854676A JP 10854676 A JP10854676 A JP 10854676A JP S5334464 A JPS5334464 A JP S5334464A
Authority
JP
Japan
Prior art keywords
liquiddgrowth
furnace
semiconductor
vapour pressure
controlling vapour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10854676A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5524259B2 (enrdf_load_stackoverflow
Inventor
Tooru Tejima
Kijiyuu Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stanley Electric Co Ltd
Original Assignee
Stanley Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stanley Electric Co Ltd filed Critical Stanley Electric Co Ltd
Priority to JP10854676A priority Critical patent/JPS5334464A/ja
Publication of JPS5334464A publication Critical patent/JPS5334464A/ja
Publication of JPS5524259B2 publication Critical patent/JPS5524259B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Led Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP10854676A 1976-09-10 1976-09-10 Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor Granted JPS5334464A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10854676A JPS5334464A (en) 1976-09-10 1976-09-10 Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10854676A JPS5334464A (en) 1976-09-10 1976-09-10 Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Publications (2)

Publication Number Publication Date
JPS5334464A true JPS5334464A (en) 1978-03-31
JPS5524259B2 JPS5524259B2 (enrdf_load_stackoverflow) 1980-06-27

Family

ID=14487558

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10854676A Granted JPS5334464A (en) 1976-09-10 1976-09-10 Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Country Status (1)

Country Link
JP (1) JPS5334464A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59116750A (ja) * 1982-12-11 1984-07-05 ユ−ロジル・エレクトロニツク・ゲ−エムベ−ハ− Ｘ線リトグラフイ用放射線マスク基層およびその製法
JPS60220933A (ja) * 1984-04-18 1985-11-05 Nec Corp Ｘ線露光マスク及びその製造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6231023U (enrdf_load_stackoverflow) * 1985-08-08 1987-02-24
KR20220093932A (ko) 2020-12-28 2022-07-05 주식회사 엘지에너지솔루션 연속 공정으로 이루어진 전지제조 공정의 수량 감지 이상을 교정하는 전지제조 장치 및 이를 이용하여 수량 감지 이상을 교정하는 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59116750A (ja) * 1982-12-11 1984-07-05 ユ−ロジル・エレクトロニツク・ゲ−エムベ−ハ− Ｘ線リトグラフイ用放射線マスク基層およびその製法
JPS60220933A (ja) * 1984-04-18 1985-11-05 Nec Corp Ｘ線露光マスク及びその製造方法

Also Published As

Publication number Publication date
JPS5524259B2 (enrdf_load_stackoverflow) 1980-06-27

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