JPS5322427B2 - - Google Patents

Info

Publication number
JPS5322427B2
JPS5322427B2 JP10247175A JP10247175A JPS5322427B2 JP S5322427 B2 JPS5322427 B2 JP S5322427B2 JP 10247175 A JP10247175 A JP 10247175A JP 10247175 A JP10247175 A JP 10247175A JP S5322427 B2 JPS5322427 B2 JP S5322427B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10247175A
Other languages
Japanese (ja)
Other versions
JPS5226171A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10247175A priority Critical patent/JPS5226171A/ja
Publication of JPS5226171A publication Critical patent/JPS5226171A/ja
Publication of JPS5322427B2 publication Critical patent/JPS5322427B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
JP10247175A 1975-08-22 1975-08-22 Mask creation method Granted JPS5226171A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10247175A JPS5226171A (en) 1975-08-22 1975-08-22 Mask creation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10247175A JPS5226171A (en) 1975-08-22 1975-08-22 Mask creation method

Publications (2)

Publication Number Publication Date
JPS5226171A JPS5226171A (en) 1977-02-26
JPS5322427B2 true JPS5322427B2 (zh) 1978-07-08

Family

ID=14328353

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10247175A Granted JPS5226171A (en) 1975-08-22 1975-08-22 Mask creation method

Country Status (1)

Country Link
JP (1) JPS5226171A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009200510A (ja) * 2001-03-28 2009-09-03 Freescale Semiconductor Inc リソグラフィックテンプレート

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
AU2001277907A1 (en) * 2000-07-17 2002-01-30 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
JP2005153091A (ja) * 2003-11-27 2005-06-16 Hitachi Ltd 転写方法及び転写装置
US7676088B2 (en) * 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
JP2008177082A (ja) * 2007-01-19 2008-07-31 Mitsubishi Electric Corp 接点開閉器

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009200510A (ja) * 2001-03-28 2009-09-03 Freescale Semiconductor Inc リソグラフィックテンプレート

Also Published As

Publication number Publication date
JPS5226171A (en) 1977-02-26

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