JPS5322423B2 - - Google Patents
Info
- Publication number
- JPS5322423B2 JPS5322423B2 JP430575A JP430575A JPS5322423B2 JP S5322423 B2 JPS5322423 B2 JP S5322423B2 JP 430575 A JP430575 A JP 430575A JP 430575 A JP430575 A JP 430575A JP S5322423 B2 JPS5322423 B2 JP S5322423B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P95/00—
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- H10P14/6314—
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- H10P14/69394—
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Landscapes
- Manufacturing Of Printed Circuit Boards (AREA)
- Weting (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US431656A US3867148A (en) | 1974-01-08 | 1974-01-08 | Making of micro-miniature electronic components by selective oxidation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50103977A JPS50103977A (cg-RX-API-DMAC10.html) | 1975-08-16 |
| JPS5322423B2 true JPS5322423B2 (cg-RX-API-DMAC10.html) | 1978-07-08 |
Family
ID=23712876
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP430575A Expired JPS5322423B2 (cg-RX-API-DMAC10.html) | 1974-01-08 | 1975-01-07 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US3867148A (cg-RX-API-DMAC10.html) |
| JP (1) | JPS5322423B2 (cg-RX-API-DMAC10.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5522252U (cg-RX-API-DMAC10.html) * | 1978-07-31 | 1980-02-13 | ||
| JPH0431612U (cg-RX-API-DMAC10.html) * | 1990-07-13 | 1992-03-13 |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4141621A (en) * | 1977-08-05 | 1979-02-27 | Honeywell Inc. | Three layer waveguide for thin film lens fabrication |
| US4115120A (en) * | 1977-09-29 | 1978-09-19 | International Business Machines Corporation | Method of forming thin film patterns by differential pre-baking of resist |
| US4180604A (en) * | 1977-12-30 | 1979-12-25 | International Business Machines Corporation | Two layer resist system |
| US4144101A (en) * | 1978-06-05 | 1979-03-13 | International Business Machines Corporation | Process for providing self-aligned doping regions by ion-implantation and lift-off |
| US4238559A (en) * | 1978-08-24 | 1980-12-09 | International Business Machines Corporation | Two layer resist system |
| US4341850A (en) * | 1979-07-19 | 1982-07-27 | Hughes Aircraft Company | Mask structure for forming semiconductor devices, comprising electron-sensitive resist patterns with controlled line profiles |
| US4283483A (en) * | 1979-07-19 | 1981-08-11 | Hughes Aircraft Company | Process for forming semiconductor devices using electron-sensitive resist patterns with controlled line profiles |
| US4524126A (en) * | 1981-06-30 | 1985-06-18 | International Business Machines Corporation | Adhesion of a photoresist to a substrate |
| US4496419A (en) * | 1983-02-28 | 1985-01-29 | Cornell Research Foundation, Inc. | Fine line patterning method for submicron devices |
| DE3427556C1 (de) * | 1984-07-26 | 1986-01-02 | Merck Patent Gmbh, 6100 Darmstadt | Verfahren zur Herstellung von Fotoresist-Reliefstrukturen mit UEberhangcharakter |
| JPS6142140A (ja) * | 1984-07-30 | 1986-02-28 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 自己整合構造の形成方法 |
| US4619894A (en) * | 1985-04-12 | 1986-10-28 | Massachusetts Institute Of Technology | Solid-transformation thermal resist |
| JPH01158731A (ja) * | 1987-12-15 | 1989-06-21 | Fujitsu Ltd | 光電子転写露光方法およびこれに用いられるマスク |
| US5900351A (en) * | 1995-01-17 | 1999-05-04 | International Business Machines Corporation | Method for stripping photoresist |
| FR2852144B1 (fr) * | 2003-03-05 | 2005-06-10 | Commissariat Energie Atomique | Procede de delimitation d'un element conducteur dispose sur une couche isolante, dispositif et transistor obtenus par ce procede |
| EP2042576A1 (en) * | 2007-09-20 | 2009-04-01 | Agfa-Gevaert | Security laminates with interlaminated transparent embossed polymer hologram. |
| EP2203305B1 (en) * | 2007-09-20 | 2011-12-07 | Agfa-Gevaert N.V. | Security laminates with interlaminated transparent embossed polymer hologram |
| CN102123873A (zh) * | 2008-04-01 | 2011-07-13 | 爱克发-格法特公司 | 具有安全特征的安全层压材料 |
| CN102256789A (zh) * | 2008-04-01 | 2011-11-23 | 爱克发-格法特公司 | 生产安全层压材料的层压方法 |
| CN105150656A (zh) * | 2008-04-01 | 2015-12-16 | 爱克发-格法特公司 | 具有可通过触摸察觉的安全性特征的安全性层压板 |
| EP2181858A1 (en) * | 2008-11-04 | 2010-05-05 | Agfa-Gevaert N.V. | Security document and methods of producing it |
| EP2199100A1 (en) * | 2008-12-22 | 2010-06-23 | Agfa-Gevaert N.V. | Security laminates for security documents. |
| EP2332738B1 (en) | 2009-12-10 | 2012-07-04 | Agfa-Gevaert | Security document with security feature on edge |
| EP2335938B1 (en) | 2009-12-18 | 2013-02-20 | Agfa-Gevaert | Laser markable security film |
| ES2400741T3 (es) | 2009-12-18 | 2013-04-11 | Agfa-Gevaert | Película de seguridad marcable por laser |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3799777A (en) * | 1972-06-20 | 1974-03-26 | Westinghouse Electric Corp | Micro-miniature electronic components by double rejection |
| JPS524149A (en) * | 1975-06-27 | 1977-01-13 | Nec Home Electronics Ltd | Television broadcasting receiving system |
-
1974
- 1974-01-08 US US431656A patent/US3867148A/en not_active Expired - Lifetime
-
1975
- 1975-01-07 JP JP430575A patent/JPS5322423B2/ja not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5522252U (cg-RX-API-DMAC10.html) * | 1978-07-31 | 1980-02-13 | ||
| JPH0431612U (cg-RX-API-DMAC10.html) * | 1990-07-13 | 1992-03-13 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS50103977A (cg-RX-API-DMAC10.html) | 1975-08-16 |
| US3867148A (en) | 1975-02-18 |