JPS5321478B2 - - Google Patents
Info
- Publication number
- JPS5321478B2 JPS5321478B2 JP7801675A JP7801675A JPS5321478B2 JP S5321478 B2 JPS5321478 B2 JP S5321478B2 JP 7801675 A JP7801675 A JP 7801675A JP 7801675 A JP7801675 A JP 7801675A JP S5321478 B2 JPS5321478 B2 JP S5321478B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/02—Treating gases
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/04—Irradiation devices with beam-forming means
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Treating Waste Gases (AREA)
- Particle Accelerators (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50078016A JPS521399A (en) | 1975-06-24 | 1975-06-24 | The fixation treatment method of a radioactive gas and its device |
| FR7619124A FR2317738A1 (fr) | 1975-06-24 | 1976-06-23 | Procede et appareil pour implanter un gaz radioactif dans une matiere destinee a emprisonner ce gaz |
| US05/699,655 US4124802A (en) | 1975-06-24 | 1976-06-24 | Method and apparatus for implanting radioactive gas in a base material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50078016A JPS521399A (en) | 1975-06-24 | 1975-06-24 | The fixation treatment method of a radioactive gas and its device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS521399A JPS521399A (en) | 1977-01-07 |
| JPS5321478B2 true JPS5321478B2 (OSRAM) | 1978-07-03 |
Family
ID=13649987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50078016A Granted JPS521399A (en) | 1975-06-24 | 1975-06-24 | The fixation treatment method of a radioactive gas and its device |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4124802A (OSRAM) |
| JP (1) | JPS521399A (OSRAM) |
| FR (1) | FR2317738A1 (OSRAM) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5813876B2 (ja) * | 1977-12-16 | 1983-03-16 | 株式会社東芝 | 放射性ガスまたは有害ガスの貯蔵方法および装置 |
| US4194123A (en) * | 1978-05-12 | 1980-03-18 | Rockwell International Corporation | Lithographic apparatus |
| JPS55101893A (en) * | 1979-01-31 | 1980-08-04 | Tokyo Shibaura Electric Co | Nuclear fuel rod |
| JPS5637023A (en) * | 1979-09-03 | 1981-04-10 | Toshiba Corp | Amorphous solid with fixed waste gas |
| FR2538603B1 (fr) * | 1982-12-23 | 1988-07-01 | Commissariat Energie Atomique | Procede de conditionnement de dechets constitues par des particules metalliques radioactives telles que les fines de dissolution des elements combustibles irradies |
| DE3323060C2 (de) * | 1983-06-27 | 1986-03-20 | Deutsche Gesellschaft für Wiederaufarbeitung von Kernbrennstoffen mbH, 3000 Hannover | Verfahren zur Fixierung von radioaktivem Krypton sowie Vorrichtung zur Durchführung des Verfahrens |
| GB8522976D0 (en) * | 1985-09-17 | 1985-10-23 | Atomic Energy Authority Uk | Ion sources |
| JP2724503B2 (ja) * | 1989-06-29 | 1998-03-09 | 東京エレクトロン株式会社 | イオン注入装置 |
| JP2662321B2 (ja) * | 1991-05-31 | 1997-10-08 | 科学技術振興事業団 | 超低速クラスターイオンビームによる表面処理方法 |
| US5224249A (en) * | 1992-01-21 | 1993-07-06 | Grumman Aerospace Corporation | Corrosion prevention of honeycomb core panel construction using ion implantation |
| US5473165A (en) * | 1993-11-16 | 1995-12-05 | Stinnett; Regan W. | Method and apparatus for altering material |
| US5445689A (en) * | 1994-08-23 | 1995-08-29 | Northrop Grumman Corporation | Pulsed ion beam surface treatment process for aluminum honeycomb panels to improve corrosion resistance |
| US5894133A (en) * | 1996-12-18 | 1999-04-13 | Implant Science Corporation | Sputter cathode for application of radioactive material |
| US5834787A (en) * | 1997-07-02 | 1998-11-10 | Bunker; Stephen N. | Device for measuring flux and accumulated dose for an ion beam containing a radioactive element |
| US5898178A (en) * | 1997-07-02 | 1999-04-27 | Implant Sciences Corporation | Ion source for generation of radioactive ion beams |
| JP3941434B2 (ja) * | 2001-08-09 | 2007-07-04 | 日新イオン機器株式会社 | イオン注入装置およびその運転方法 |
| DE102004014618B3 (de) * | 2004-03-23 | 2005-11-10 | Eads Space Transportation Gmbh | Elektrothermisches Impuls-Triebwerk |
| JP5324090B2 (ja) | 2004-05-30 | 2013-10-23 | ぺブル ベッド モジュラー リアクター （プロプリエタリー）リミテッド | 原子力プラントおよび帯電粒子除去方法 |
| US8329260B2 (en) * | 2008-03-11 | 2012-12-11 | Varian Semiconductor Equipment Associates, Inc. | Cooled cleaving implant |
| US10566169B1 (en) | 2008-06-30 | 2020-02-18 | Nexgen Semi Holding, Inc. | Method and device for spatial charged particle bunching |
| US10991545B2 (en) | 2008-06-30 | 2021-04-27 | Nexgen Semi Holding, Inc. | Method and device for spatial charged particle bunching |
| TWI412052B (zh) * | 2009-07-14 | 2013-10-11 | Univ Nat Central | 以奈米粒子產生離子源之方法 |
| EP2718935B1 (en) * | 2011-06-08 | 2016-08-17 | BAE Systems PLC | Electricity generation |
| EP2533250A1 (en) * | 2011-06-08 | 2012-12-12 | BAE Systems Plc | Electricity generation |
| JP2022190639A (ja) * | 2021-06-14 | 2022-12-26 | 晴雄 森重 | 燃料デブリの回収工法 |
| US12493005B1 (en) | 2022-06-07 | 2025-12-09 | Nexgen Semi Holding, Inc. | Extended range active illumination imager |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2682611A (en) * | 1953-01-29 | 1954-06-29 | Atomic Energy Commission | Ion source |
| US3434894A (en) * | 1965-10-06 | 1969-03-25 | Ion Physics Corp | Fabricating solid state devices by ion implantation |
| US3585397A (en) * | 1968-10-04 | 1971-06-15 | Hughes Aircraft Co | Programmed fine ion implantation beam system |
| US3569757A (en) * | 1968-10-04 | 1971-03-09 | Houghes Aircraft Co | Acceleration system for implanting ions in specimen |
| US3786359A (en) * | 1969-03-28 | 1974-01-15 | Alpha Ind Inc | Ion accelerator and ion species selector |
| US3699334A (en) * | 1969-06-16 | 1972-10-17 | Kollsman Instr Corp | Apparatus using a beam of positive ions for controlled erosion of surfaces |
-
1975
- 1975-06-24 JP JP50078016A patent/JPS521399A/ja active Granted
-
1976
- 1976-06-23 FR FR7619124A patent/FR2317738A1/fr active Granted
- 1976-06-24 US US05/699,655 patent/US4124802A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US4124802A (en) | 1978-11-07 |
| FR2317738B1 (OSRAM) | 1982-11-12 |
| JPS521399A (en) | 1977-01-07 |
| FR2317738A1 (fr) | 1977-02-04 |