JPS532044B1 - - Google Patents

Info

Publication number
JPS532044B1
JPS532044B1 JP4690071A JP4690071A JPS532044B1 JP S532044 B1 JPS532044 B1 JP S532044B1 JP 4690071 A JP4690071 A JP 4690071A JP 4690071 A JP4690071 A JP 4690071A JP S532044 B1 JPS532044 B1 JP S532044B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4690071A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS532044B1 publication Critical patent/JPS532044B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D339/00—Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
    • C07D339/02—Five-membered rings
    • C07D339/04—Five-membered rings having the hetero atoms in positions 1 and 2, e.g. lipoic acid
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Colloid Chemistry (AREA)
  • Materials For Photolithography (AREA)
JP4690071A 1970-07-02 1971-06-29 Pending JPS532044B1 (ref)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US5213170A 1970-07-02 1970-07-02

Publications (1)

Publication Number Publication Date
JPS532044B1 true JPS532044B1 (ref) 1978-01-25

Family

ID=21975669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4690071A Pending JPS532044B1 (ref) 1970-07-02 1971-06-29

Country Status (5)

Country Link
US (1) US3801327A (ref)
JP (1) JPS532044B1 (ref)
DE (1) DE2132063A1 (ref)
FR (1) FR2097958A5 (ref)
GB (1) GB1344915A (ref)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61217036A (ja) * 1985-03-22 1986-09-26 Kuraray Co Ltd 水溶性感光性組成物
US6287749B1 (en) * 1997-05-05 2001-09-11 First Chemical Corporation Biradical photoinitiators and photopolymerizable compositions
US6783914B1 (en) 2000-02-25 2004-08-31 Massachusetts Institute Of Technology Encapsulated inorganic resists
JP6879765B2 (ja) * 2017-02-10 2021-06-02 株式会社ダイセル レジスト親水化処理剤
CN119874666B (zh) * 2025-01-25 2025-11-25 常州大学 一类含可降解二硫键的过氧化酯引发剂及其制备可降解支化聚合物的应用

Also Published As

Publication number Publication date
GB1344915A (en) 1974-01-23
DE2132063A1 (de) 1972-01-05
FR2097958A5 (ref) 1972-03-03
US3801327A (en) 1974-04-02

Similar Documents

Publication Publication Date Title
DK135873C (ref)
AU3481871A (ref)
JPS464950A (ref)
JPS464873A (ref)
JPS532044B1 (ref)
JPS464874A (ref)
JPS4637362Y1 (ref)
DK135565C (ref)
JPS4844939B1 (ref)
JPS4839421B1 (ref)
JPS4844921B1 (ref)
JPS4617130Y1 (ref)
JPS4839312B1 (ref)
JPS5013585Y1 (ref)
DK135720C (ref)
AU465419B2 (ref)
JPS4731259Y1 (ref)
JPS4839803B1 (ref)
JPS5014186B1 (ref)
JPS4845139Y1 (ref)
JPS4845134Y1 (ref)
JPS5016180Y1 (ref)
JPS4732540Y1 (ref)
JPS4839863Y1 (ref)
JPS4839845Y1 (ref)