JPS5319778A - Singlemode semiconductor laser and its production - Google Patents
Singlemode semiconductor laser and its productionInfo
- Publication number
- JPS5319778A JPS5319778A JP9433676A JP9433676A JPS5319778A JP S5319778 A JPS5319778 A JP S5319778A JP 9433676 A JP9433676 A JP 9433676A JP 9433676 A JP9433676 A JP 9433676A JP S5319778 A JPS5319778 A JP S5319778A
- Authority
- JP
- Japan
- Prior art keywords
- singlemode
- semiconductor laser
- production
- producing
- ion implantation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
- H01S5/3068—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure deep levels
Abstract
PURPOSE:To obtain a semiconductor laser which stably oscillates in singlemode by forming trapping centers within stripe form active layers through ion implantation at the time of producing the singlemode semiconductor laser.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9433676A JPS5319778A (en) | 1976-08-06 | 1976-08-06 | Singlemode semiconductor laser and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9433676A JPS5319778A (en) | 1976-08-06 | 1976-08-06 | Singlemode semiconductor laser and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5319778A true JPS5319778A (en) | 1978-02-23 |
Family
ID=14107429
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9433676A Pending JPS5319778A (en) | 1976-08-06 | 1976-08-06 | Singlemode semiconductor laser and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5319778A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4511408A (en) * | 1982-04-22 | 1985-04-16 | The Board Of Trustees Of The University Of Illinois | Semiconductor device fabrication with disordering elements introduced into active region |
US4523961A (en) * | 1982-11-12 | 1985-06-18 | At&T Bell Laboratories | Method of improving current confinement in semiconductor lasers by inert ion bombardment |
US4539743A (en) * | 1983-11-28 | 1985-09-10 | At&T Bell Laboratories | Production of semiconductor structures with buried resistive or conductive regions by controlled ion bombardment and heat treatment |
US4610731A (en) * | 1985-04-03 | 1986-09-09 | At&T Bell Laboratories | Shallow impurity neutralization |
JPS62110448A (en) * | 1985-11-07 | 1987-05-21 | 株式会社東芝 | Synchronized speed controller |
US5126277A (en) * | 1988-06-07 | 1992-06-30 | Oki Electric Industry Co., Ltd. | Method of manufacturing a semiconductor device having a resistor |
-
1976
- 1976-08-06 JP JP9433676A patent/JPS5319778A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4511408A (en) * | 1982-04-22 | 1985-04-16 | The Board Of Trustees Of The University Of Illinois | Semiconductor device fabrication with disordering elements introduced into active region |
US4523961A (en) * | 1982-11-12 | 1985-06-18 | At&T Bell Laboratories | Method of improving current confinement in semiconductor lasers by inert ion bombardment |
US4539743A (en) * | 1983-11-28 | 1985-09-10 | At&T Bell Laboratories | Production of semiconductor structures with buried resistive or conductive regions by controlled ion bombardment and heat treatment |
US4610731A (en) * | 1985-04-03 | 1986-09-09 | At&T Bell Laboratories | Shallow impurity neutralization |
JPS62110448A (en) * | 1985-11-07 | 1987-05-21 | 株式会社東芝 | Synchronized speed controller |
JPH082157B2 (en) * | 1985-11-07 | 1996-01-10 | 株式会社東芝 | Synchronous speed controller |
US5126277A (en) * | 1988-06-07 | 1992-06-30 | Oki Electric Industry Co., Ltd. | Method of manufacturing a semiconductor device having a resistor |
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