JPS5318441A - Method of forming holes in thin plates of permeable metal by etching - Google Patents
Method of forming holes in thin plates of permeable metal by etchingInfo
- Publication number
- JPS5318441A JPS5318441A JP9292277A JP9292277A JPS5318441A JP S5318441 A JPS5318441 A JP S5318441A JP 9292277 A JP9292277 A JP 9292277A JP 9292277 A JP9292277 A JP 9292277A JP S5318441 A JPS5318441 A JP S5318441A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- thin plates
- forming holes
- permeable metal
- permeable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 title 1
- 239000002184 metal Substances 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
- H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US71074376A | 1976-08-02 | 1976-08-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5318441A true JPS5318441A (en) | 1978-02-20 |
| JPS5440450B2 JPS5440450B2 (enExample) | 1979-12-04 |
Family
ID=24855337
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9292277A Granted JPS5318441A (en) | 1976-08-02 | 1977-08-01 | Method of forming holes in thin plates of permeable metal by etching |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS5318441A (enExample) |
| DE (1) | DE2734842C3 (enExample) |
| FR (1) | FR2360686A1 (enExample) |
| IT (1) | IT1077420B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61199039A (ja) * | 1985-02-28 | 1986-09-03 | Sumitomo Electric Ind Ltd | 細径高炭素鋼線材のパテンテイング方法 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4052725A (en) * | 1976-08-02 | 1977-10-04 | Rca Corporation | Cathode-ray tube screening exposure method |
| JP3034273B2 (ja) * | 1989-10-07 | 2000-04-17 | 株式会社東芝 | 露光方法及び露光装置 |
| US5288729A (en) * | 1989-10-07 | 1994-02-22 | Kabushiki Kaisha Toshiba | Exposing method and apparatus |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3666579A (en) * | 1970-06-15 | 1972-05-30 | Zenith Radio Corp | Etching electrodes |
| US3702277A (en) * | 1970-09-23 | 1972-11-07 | Zenith Radio Corp | Control system for mask etching apparatus |
-
1977
- 1977-07-19 IT IT2589277A patent/IT1077420B/it active
- 1977-07-27 FR FR7723031A patent/FR2360686A1/fr not_active Withdrawn
- 1977-08-01 JP JP9292277A patent/JPS5318441A/ja active Granted
- 1977-08-02 DE DE19772734842 patent/DE2734842C3/de not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61199039A (ja) * | 1985-02-28 | 1986-09-03 | Sumitomo Electric Ind Ltd | 細径高炭素鋼線材のパテンテイング方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2734842C3 (de) | 1979-11-15 |
| JPS5440450B2 (enExample) | 1979-12-04 |
| DE2734842B2 (de) | 1979-03-29 |
| DE2734842A1 (de) | 1978-02-09 |
| FR2360686A1 (fr) | 1978-03-03 |
| IT1077420B (it) | 1985-05-04 |
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