JPS53149389A - Measurement method of copper ions and chelating agent concentration in chemical copper plating solution - Google Patents

Measurement method of copper ions and chelating agent concentration in chemical copper plating solution

Info

Publication number
JPS53149389A
JPS53149389A JP6333777A JP6333777A JPS53149389A JP S53149389 A JPS53149389 A JP S53149389A JP 6333777 A JP6333777 A JP 6333777A JP 6333777 A JP6333777 A JP 6333777A JP S53149389 A JPS53149389 A JP S53149389A
Authority
JP
Japan
Prior art keywords
measurement method
plating solution
chelating agent
agent concentration
copper plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6333777A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0331789B2 (enrdf_load_stackoverflow
Inventor
Hitoshi Oka
Kenji Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6333777A priority Critical patent/JPS53149389A/ja
Publication of JPS53149389A publication Critical patent/JPS53149389A/ja
Publication of JPH0331789B2 publication Critical patent/JPH0331789B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemically Coating (AREA)
JP6333777A 1977-06-01 1977-06-01 Measurement method of copper ions and chelating agent concentration in chemical copper plating solution Granted JPS53149389A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6333777A JPS53149389A (en) 1977-06-01 1977-06-01 Measurement method of copper ions and chelating agent concentration in chemical copper plating solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6333777A JPS53149389A (en) 1977-06-01 1977-06-01 Measurement method of copper ions and chelating agent concentration in chemical copper plating solution

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP59137118A Division JPS60104248A (ja) 1984-07-04 1984-07-04 化学銅めつき液中のキレ−ト剤濃度測定法
JP59137117A Division JPS60104247A (ja) 1984-07-04 1984-07-04 化学銅めつき液中の銅イオンとキレ−ト剤濃度測定装置

Publications (2)

Publication Number Publication Date
JPS53149389A true JPS53149389A (en) 1978-12-26
JPH0331789B2 JPH0331789B2 (enrdf_load_stackoverflow) 1991-05-08

Family

ID=13226314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6333777A Granted JPS53149389A (en) 1977-06-01 1977-06-01 Measurement method of copper ions and chelating agent concentration in chemical copper plating solution

Country Status (1)

Country Link
JP (1) JPS53149389A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007517186A (ja) * 2003-06-13 2007-06-28 シャーリット，ユージン 無電解めっき浴における錯化剤濃度の測定
JP2009168450A (ja) * 2007-12-29 2009-07-30 Shino Test Corp 試料中の金属の測定方法
JP2017122650A (ja) * 2016-01-07 2017-07-13 株式会社ニイタカ キレート剤の定量方法
CN112180029A (zh) * 2020-09-17 2021-01-05 大连博融新材料有限公司 一种金属铵盐中铵含量的检测方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007517186A (ja) * 2003-06-13 2007-06-28 シャーリット，ユージン 無電解めっき浴における錯化剤濃度の測定
JP2009168450A (ja) * 2007-12-29 2009-07-30 Shino Test Corp 試料中の金属の測定方法
JP2017122650A (ja) * 2016-01-07 2017-07-13 株式会社ニイタカ キレート剤の定量方法
CN112180029A (zh) * 2020-09-17 2021-01-05 大连博融新材料有限公司 一种金属铵盐中铵含量的检测方法

Also Published As

Publication number Publication date
JPH0331789B2 (enrdf_load_stackoverflow) 1991-05-08

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