JPS53144270A - Projection-type mask aligner - Google Patents

Projection-type mask aligner

Info

Publication number
JPS53144270A
JPS53144270A JP5868677A JP5868677A JPS53144270A JP S53144270 A JPS53144270 A JP S53144270A JP 5868677 A JP5868677 A JP 5868677A JP 5868677 A JP5868677 A JP 5868677A JP S53144270 A JPS53144270 A JP S53144270A
Authority
JP
Japan
Prior art keywords
projection
type mask
mask aligner
mask
recision
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5868677A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6142419B2 (enrdf_load_stackoverflow
Inventor
Nobuyuki Akiyama
Mitsuyoshi Koizumi
Yoshimasa Oshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5868677A priority Critical patent/JPS53144270A/ja
Publication of JPS53144270A publication Critical patent/JPS53144270A/ja
Publication of JPS6142419B2 publication Critical patent/JPS6142419B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP5868677A 1977-05-23 1977-05-23 Projection-type mask aligner Granted JPS53144270A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5868677A JPS53144270A (en) 1977-05-23 1977-05-23 Projection-type mask aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5868677A JPS53144270A (en) 1977-05-23 1977-05-23 Projection-type mask aligner

Publications (2)

Publication Number Publication Date
JPS53144270A true JPS53144270A (en) 1978-12-15
JPS6142419B2 JPS6142419B2 (enrdf_load_stackoverflow) 1986-09-20

Family

ID=13091426

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5868677A Granted JPS53144270A (en) 1977-05-23 1977-05-23 Projection-type mask aligner

Country Status (1)

Country Link
JP (1) JPS53144270A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5673437A (en) * 1979-11-20 1981-06-18 Fujitsu Ltd Far-ultraviolet light exposing method and device
JPS58173831A (ja) * 1982-04-05 1983-10-12 Oki Electric Ind Co Ltd ウエ−ハアラインメント方法
JPS58173832A (ja) * 1982-04-05 1983-10-12 Oki Electric Ind Co Ltd ウエ−ハアラインメント方法
JPS5989421A (ja) * 1982-11-15 1984-05-23 Canon Inc 位置検出装置
JPS62247372A (ja) * 1987-02-06 1987-10-28 Hitachi Ltd 縮小投影露光方法
JPH07183213A (ja) * 1994-09-30 1995-07-21 Hitachi Ltd 投影露光方法
EP2150856B1 (de) * 2007-05-24 2012-08-01 Süss MicroTec Lithography GmbH Mask aligner

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4960683A (enrdf_load_stackoverflow) * 1972-10-13 1974-06-12
JPS5050873A (enrdf_load_stackoverflow) * 1973-07-27 1975-05-07

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4960683A (enrdf_load_stackoverflow) * 1972-10-13 1974-06-12
JPS5050873A (enrdf_load_stackoverflow) * 1973-07-27 1975-05-07

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5673437A (en) * 1979-11-20 1981-06-18 Fujitsu Ltd Far-ultraviolet light exposing method and device
JPS58173831A (ja) * 1982-04-05 1983-10-12 Oki Electric Ind Co Ltd ウエ−ハアラインメント方法
JPS58173832A (ja) * 1982-04-05 1983-10-12 Oki Electric Ind Co Ltd ウエ−ハアラインメント方法
JPS5989421A (ja) * 1982-11-15 1984-05-23 Canon Inc 位置検出装置
JPS62247372A (ja) * 1987-02-06 1987-10-28 Hitachi Ltd 縮小投影露光方法
JPH07183213A (ja) * 1994-09-30 1995-07-21 Hitachi Ltd 投影露光方法
EP2150856B1 (de) * 2007-05-24 2012-08-01 Süss MicroTec Lithography GmbH Mask aligner

Also Published As

Publication number Publication date
JPS6142419B2 (enrdf_load_stackoverflow) 1986-09-20

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