JPS53142177A - Vapor-phase reaction device for semiconductor device - Google Patents

Vapor-phase reaction device for semiconductor device

Info

Publication number
JPS53142177A
JPS53142177A JP5647377A JP5647377A JPS53142177A JP S53142177 A JPS53142177 A JP S53142177A JP 5647377 A JP5647377 A JP 5647377A JP 5647377 A JP5647377 A JP 5647377A JP S53142177 A JPS53142177 A JP S53142177A
Authority
JP
Japan
Prior art keywords
vapor
phase reaction
semiconductor device
reaction device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5647377A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6225254B2 (enrdf_load_stackoverflow
Inventor
Masaru Watanabe
Masahide Kudo
Takahiro Morimatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP5647377A priority Critical patent/JPS53142177A/ja
Publication of JPS53142177A publication Critical patent/JPS53142177A/ja
Publication of JPS6225254B2 publication Critical patent/JPS6225254B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JP5647377A 1977-05-18 1977-05-18 Vapor-phase reaction device for semiconductor device Granted JPS53142177A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5647377A JPS53142177A (en) 1977-05-18 1977-05-18 Vapor-phase reaction device for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5647377A JPS53142177A (en) 1977-05-18 1977-05-18 Vapor-phase reaction device for semiconductor device

Publications (2)

Publication Number Publication Date
JPS53142177A true JPS53142177A (en) 1978-12-11
JPS6225254B2 JPS6225254B2 (enrdf_load_stackoverflow) 1987-06-02

Family

ID=13028065

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5647377A Granted JPS53142177A (en) 1977-05-18 1977-05-18 Vapor-phase reaction device for semiconductor device

Country Status (1)

Country Link
JP (1) JPS53142177A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6225254B2 (enrdf_load_stackoverflow) 1987-06-02

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