Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Fujitsu Ltd
Original Assignee
Fujitsu Ltd
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Filing date
Publication date
Application filed by Fujitsu LtdfiledCriticalFujitsu Ltd
Priority to JP5675777ApriorityCriticalpatent/JPS53141581A/en
Publication of JPS53141581ApublicationCriticalpatent/JPS53141581A/en
Publication of JPS562409B2publicationCriticalpatent/JPS562409B2/ja
PURPOSE: To perform a surface process while maintaining reaction conditions constant, by detecting ultraviolet rays generated by glow discharging, and by adjusting the output of a discharge power supply or flux of gas supplied into a discharge chamber.
COPYRIGHT: (C)1978,JPO&Japio
JP5675777A1977-05-171977-05-17Processing method for semiconductor surface
GrantedJPS53141581A
(en)