JPS53134367A - Xxray mask - Google Patents
Xxray maskInfo
- Publication number
- JPS53134367A JPS53134367A JP4937377A JP4937377A JPS53134367A JP S53134367 A JPS53134367 A JP S53134367A JP 4937377 A JP4937377 A JP 4937377A JP 4937377 A JP4937377 A JP 4937377A JP S53134367 A JPS53134367 A JP S53134367A
- Authority
- JP
- Japan
- Prior art keywords
- xxray
- mask
- xxray mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4937377A JPS53134367A (en) | 1977-04-28 | 1977-04-28 | Xxray mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4937377A JPS53134367A (en) | 1977-04-28 | 1977-04-28 | Xxray mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53134367A true JPS53134367A (en) | 1978-11-22 |
Family
ID=12829219
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4937377A Pending JPS53134367A (en) | 1977-04-28 | 1977-04-28 | Xxray mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53134367A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55118039A (en) * | 1979-03-07 | 1980-09-10 | Fujitsu Ltd | Mask for x-ray exposure |
JPS55127559A (en) * | 1979-03-26 | 1980-10-02 | Fujitsu Ltd | Blank mask for x-ray exposure and using method therefor |
JPS5776546A (en) * | 1980-10-30 | 1982-05-13 | Nec Corp | Transfer mask for x-ray exposure |
JPS62151737U (ja) * | 1987-02-25 | 1987-09-26 | ||
JPS63200530A (ja) * | 1987-02-17 | 1988-08-18 | Matsushita Electronics Corp | X線マスクの製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5057778A (ja) * | 1973-09-17 | 1975-05-20 |
-
1977
- 1977-04-28 JP JP4937377A patent/JPS53134367A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5057778A (ja) * | 1973-09-17 | 1975-05-20 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55118039A (en) * | 1979-03-07 | 1980-09-10 | Fujitsu Ltd | Mask for x-ray exposure |
JPS6161252B2 (ja) * | 1979-03-07 | 1986-12-24 | Fujitsu Ltd | |
JPS55127559A (en) * | 1979-03-26 | 1980-10-02 | Fujitsu Ltd | Blank mask for x-ray exposure and using method therefor |
JPS625332B2 (ja) * | 1979-03-26 | 1987-02-04 | Fujitsu Ltd | |
JPS5776546A (en) * | 1980-10-30 | 1982-05-13 | Nec Corp | Transfer mask for x-ray exposure |
JPS63200530A (ja) * | 1987-02-17 | 1988-08-18 | Matsushita Electronics Corp | X線マスクの製造方法 |
JPS62151737U (ja) * | 1987-02-25 | 1987-09-26 |
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