JPS53125769A - Sputter etching method and container used for it - Google Patents

Sputter etching method and container used for it

Info

Publication number
JPS53125769A
JPS53125769A JP4052077A JP4052077A JPS53125769A JP S53125769 A JPS53125769 A JP S53125769A JP 4052077 A JP4052077 A JP 4052077A JP 4052077 A JP4052077 A JP 4052077A JP S53125769 A JPS53125769 A JP S53125769A
Authority
JP
Japan
Prior art keywords
sputter etching
etching method
container used
test piece
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4052077A
Other languages
Japanese (ja)
Other versions
JPS6026295B2 (en
Inventor
Masao Tajima
Yukinori Kuroki
Koji Mizusawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP4052077A priority Critical patent/JPS6026295B2/en
Publication of JPS53125769A publication Critical patent/JPS53125769A/en
Publication of JPS6026295B2 publication Critical patent/JPS6026295B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To increase the etching speed for Si oxide on a test piece, by performing sputter etching the test piece by surrounding it with a polypropylene wall with open holes.
COPYRIGHT: (C)1978,JPO&Japio
JP4052077A 1977-04-08 1977-04-08 Spatsuta etching method and container used therefor Expired JPS6026295B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4052077A JPS6026295B2 (en) 1977-04-08 1977-04-08 Spatsuta etching method and container used therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4052077A JPS6026295B2 (en) 1977-04-08 1977-04-08 Spatsuta etching method and container used therefor

Publications (2)

Publication Number Publication Date
JPS53125769A true JPS53125769A (en) 1978-11-02
JPS6026295B2 JPS6026295B2 (en) 1985-06-22

Family

ID=12582779

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4052077A Expired JPS6026295B2 (en) 1977-04-08 1977-04-08 Spatsuta etching method and container used therefor

Country Status (1)

Country Link
JP (1) JPS6026295B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5582438A (en) * 1978-12-15 1980-06-21 Nec Corp Plasma etching device
JPS62106628A (en) * 1985-11-01 1987-05-18 Fujitsu Ltd Vacuum processing device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03164586A (en) * 1989-11-22 1991-07-16 Fujita Corp Method and apparatus for force-feeding fluid by means of squeeze-type pump
JPH03118284U (en) * 1990-03-16 1991-12-06

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5582438A (en) * 1978-12-15 1980-06-21 Nec Corp Plasma etching device
JPS62106628A (en) * 1985-11-01 1987-05-18 Fujitsu Ltd Vacuum processing device

Also Published As

Publication number Publication date
JPS6026295B2 (en) 1985-06-22

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