JPS53125769A - Sputter etching method and container used for it - Google Patents
Sputter etching method and container used for itInfo
- Publication number
- JPS53125769A JPS53125769A JP4052077A JP4052077A JPS53125769A JP S53125769 A JPS53125769 A JP S53125769A JP 4052077 A JP4052077 A JP 4052077A JP 4052077 A JP4052077 A JP 4052077A JP S53125769 A JPS53125769 A JP S53125769A
- Authority
- JP
- Japan
- Prior art keywords
- sputter etching
- etching method
- container used
- test piece
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To increase the etching speed for Si oxide on a test piece, by performing sputter etching the test piece by surrounding it with a polypropylene wall with open holes.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4052077A JPS6026295B2 (en) | 1977-04-08 | 1977-04-08 | Spatsuta etching method and container used therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4052077A JPS6026295B2 (en) | 1977-04-08 | 1977-04-08 | Spatsuta etching method and container used therefor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53125769A true JPS53125769A (en) | 1978-11-02 |
JPS6026295B2 JPS6026295B2 (en) | 1985-06-22 |
Family
ID=12582779
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4052077A Expired JPS6026295B2 (en) | 1977-04-08 | 1977-04-08 | Spatsuta etching method and container used therefor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6026295B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5582438A (en) * | 1978-12-15 | 1980-06-21 | Nec Corp | Plasma etching device |
JPS62106628A (en) * | 1985-11-01 | 1987-05-18 | Fujitsu Ltd | Vacuum processing device |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03164586A (en) * | 1989-11-22 | 1991-07-16 | Fujita Corp | Method and apparatus for force-feeding fluid by means of squeeze-type pump |
JPH03118284U (en) * | 1990-03-16 | 1991-12-06 |
-
1977
- 1977-04-08 JP JP4052077A patent/JPS6026295B2/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5582438A (en) * | 1978-12-15 | 1980-06-21 | Nec Corp | Plasma etching device |
JPS62106628A (en) * | 1985-11-01 | 1987-05-18 | Fujitsu Ltd | Vacuum processing device |
Also Published As
Publication number | Publication date |
---|---|
JPS6026295B2 (en) | 1985-06-22 |
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