JPS5311828B2 - - Google Patents
Info
- Publication number
- JPS5311828B2 JPS5311828B2 JP10196674A JP10196674A JPS5311828B2 JP S5311828 B2 JPS5311828 B2 JP S5311828B2 JP 10196674 A JP10196674 A JP 10196674A JP 10196674 A JP10196674 A JP 10196674A JP S5311828 B2 JPS5311828 B2 JP S5311828B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10196674A JPS5311828B2 (cs) | 1974-09-06 | 1974-09-06 | |
| FR7527498A FR2284186A1 (fr) | 1974-09-06 | 1975-09-08 | Appareil et procede pour former un modele de dessin desire sur un objet au moyen d'un faisceau de particules chargees |
| US05/687,690 US4075488A (en) | 1974-09-06 | 1976-05-19 | Pattern forming apparatus using quadrupole lenses |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10196674A JPS5311828B2 (cs) | 1974-09-06 | 1974-09-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5129091A JPS5129091A (cs) | 1976-03-11 |
| JPS5311828B2 true JPS5311828B2 (cs) | 1978-04-25 |
Family
ID=14314598
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10196674A Expired JPS5311828B2 (cs) | 1974-09-06 | 1974-09-06 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS5311828B2 (cs) |
| FR (1) | FR2284186A1 (cs) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5360162A (en) * | 1976-11-10 | 1978-05-30 | Toshiba Corp | Electron beam irradiation device |
| CA1100237A (en) * | 1977-03-23 | 1981-04-28 | Roger F.W. Pease | Multiple electron beam exposure system |
| FR2412939A1 (fr) * | 1977-12-23 | 1979-07-20 | Anvar | Implanteur d'ions a fort courant |
| JPS6091630A (ja) * | 1983-10-25 | 1985-05-23 | Matsushita Electric Ind Co Ltd | 不純物拡散方法 |
| AT388628B (de) * | 1986-01-31 | 1989-08-10 | Ims Ionen Mikrofab Syst | Einrichtung fuer projektionsgeraete |
| KR100538813B1 (ko) * | 2004-07-31 | 2005-12-23 | 주식회사 하이닉스반도체 | 트랜지스터 파라미터의 균일도 확보를 위한 이온주입 장치및 그를 이용한 이온주입 방법 |
| KR20240097977A (ko) | 2017-09-29 | 2024-06-27 | 에이에스엠엘 네델란즈 비.브이. | 하전 입자 빔 검사를 위한 샘플 사전-충전 방법들 및 장치들 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL6807439A (cs) * | 1968-05-27 | 1969-12-01 |
-
1974
- 1974-09-06 JP JP10196674A patent/JPS5311828B2/ja not_active Expired
-
1975
- 1975-09-08 FR FR7527498A patent/FR2284186A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5129091A (cs) | 1976-03-11 |
| FR2284186B1 (cs) | 1979-01-19 |
| FR2284186A1 (fr) | 1976-04-02 |