JPS529503B2 - - Google Patents
Info
- Publication number
- JPS529503B2 JPS529503B2 JP5166272A JP5166272A JPS529503B2 JP S529503 B2 JPS529503 B2 JP S529503B2 JP 5166272 A JP5166272 A JP 5166272A JP 5166272 A JP5166272 A JP 5166272A JP S529503 B2 JPS529503 B2 JP S529503B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5166272A JPS529503B2 (en:Method) | 1972-05-26 | 1972-05-26 | |
| US00362733A US3821545A (en) | 1972-05-26 | 1973-05-22 | Mask alignment in manufacturing semiconductor integrated circuits |
| GB2501473A GB1425610A (en) | 1972-05-26 | 1973-05-24 | Mask alignment in manufacturing semiconductor integrated circuits |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5166272A JPS529503B2 (en:Method) | 1972-05-26 | 1972-05-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4911072A JPS4911072A (en:Method) | 1974-01-31 |
| JPS529503B2 true JPS529503B2 (en:Method) | 1977-03-16 |
Family
ID=12893074
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5166272A Expired JPS529503B2 (en:Method) | 1972-05-26 | 1972-05-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS529503B2 (en:Method) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5463677A (en) * | 1977-10-29 | 1979-05-22 | Oki Electric Ind Co Ltd | Production of mask for integrated circuit |
| US4855792A (en) * | 1988-05-13 | 1989-08-08 | Mrs Technology, Inc. | Optical alignment system for use in photolithography and having reduced reflectance errors |
| IT1219699B (it) * | 1988-05-27 | 1990-05-24 | Geronazzo Spa | Agente tensio attivo a base di (fenil 1 etil) fenoli poliossialchilenati,suo procedimento di preparazione e suo impiego per ottenere soluzioni concentrate emulsionabili di sostanze attive |
-
1972
- 1972-05-26 JP JP5166272A patent/JPS529503B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4911072A (en:Method) | 1974-01-31 |