JPS529503B2 - - Google Patents

Info

Publication number
JPS529503B2
JPS529503B2 JP5166272A JP5166272A JPS529503B2 JP S529503 B2 JPS529503 B2 JP S529503B2 JP 5166272 A JP5166272 A JP 5166272A JP 5166272 A JP5166272 A JP 5166272A JP S529503 B2 JPS529503 B2 JP S529503B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5166272A
Other versions
JPS4911072A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5166272A priority Critical patent/JPS529503B2/ja
Priority to US00362733A priority patent/US3821545A/en
Priority to GB2501473A priority patent/GB1425610A/en
Publication of JPS4911072A publication Critical patent/JPS4911072A/ja
Publication of JPS529503B2 publication Critical patent/JPS529503B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP5166272A 1972-05-26 1972-05-26 Expired JPS529503B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP5166272A JPS529503B2 (ja) 1972-05-26 1972-05-26
US00362733A US3821545A (en) 1972-05-26 1973-05-22 Mask alignment in manufacturing semiconductor integrated circuits
GB2501473A GB1425610A (en) 1972-05-26 1973-05-24 Mask alignment in manufacturing semiconductor integrated circuits

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5166272A JPS529503B2 (ja) 1972-05-26 1972-05-26

Publications (2)

Publication Number Publication Date
JPS4911072A JPS4911072A (ja) 1974-01-31
JPS529503B2 true JPS529503B2 (ja) 1977-03-16

Family

ID=12893074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5166272A Expired JPS529503B2 (ja) 1972-05-26 1972-05-26

Country Status (1)

Country Link
JP (1) JPS529503B2 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5463677A (en) * 1977-10-29 1979-05-22 Oki Electric Ind Co Ltd Production of mask for integrated circuit
US4855792A (en) * 1988-05-13 1989-08-08 Mrs Technology, Inc. Optical alignment system for use in photolithography and having reduced reflectance errors
IT1219699B (it) * 1988-05-27 1990-05-24 Geronazzo Spa Agente tensio attivo a base di (fenil 1 etil) fenoli poliossialchilenati,suo procedimento di preparazione e suo impiego per ottenere soluzioni concentrate emulsionabili di sostanze attive

Also Published As

Publication number Publication date
JPS4911072A (ja) 1974-01-31

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