JPS4911072A - - Google Patents
Info
- Publication number
- JPS4911072A JPS4911072A JP5166272A JP5166272A JPS4911072A JP S4911072 A JPS4911072 A JP S4911072A JP 5166272 A JP5166272 A JP 5166272A JP 5166272 A JP5166272 A JP 5166272A JP S4911072 A JPS4911072 A JP S4911072A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5166272A JPS529503B2 (en:Method) | 1972-05-26 | 1972-05-26 | |
| US00362733A US3821545A (en) | 1972-05-26 | 1973-05-22 | Mask alignment in manufacturing semiconductor integrated circuits |
| GB2501473A GB1425610A (en) | 1972-05-26 | 1973-05-24 | Mask alignment in manufacturing semiconductor integrated circuits |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5166272A JPS529503B2 (en:Method) | 1972-05-26 | 1972-05-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4911072A true JPS4911072A (en:Method) | 1974-01-31 |
| JPS529503B2 JPS529503B2 (en:Method) | 1977-03-16 |
Family
ID=12893074
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5166272A Expired JPS529503B2 (en:Method) | 1972-05-26 | 1972-05-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS529503B2 (en:Method) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5463677A (en) * | 1977-10-29 | 1979-05-22 | Oki Electric Ind Co Ltd | Production of mask for integrated circuit |
| JPH0218924A (ja) * | 1988-05-13 | 1990-01-23 | Mrs Technol Inc | フォトリソグラフィに用いられる低反射誤差の光学位置合せ装置 |
| JPH02157031A (ja) * | 1988-05-27 | 1990-06-15 | Geronazzo Spa | ポリオキシアルキレン化（１―フェニルエチル）フェノールをベースにした界面活性剤、その製造方法及びそれの有効物質の乳化性濃厚溶液の製造への用途 |
-
1972
- 1972-05-26 JP JP5166272A patent/JPS529503B2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5463677A (en) * | 1977-10-29 | 1979-05-22 | Oki Electric Ind Co Ltd | Production of mask for integrated circuit |
| JPH0218924A (ja) * | 1988-05-13 | 1990-01-23 | Mrs Technol Inc | フォトリソグラフィに用いられる低反射誤差の光学位置合せ装置 |
| JPH02157031A (ja) * | 1988-05-27 | 1990-06-15 | Geronazzo Spa | ポリオキシアルキレン化（１―フェニルエチル）フェノールをベースにした界面活性剤、その製造方法及びそれの有効物質の乳化性濃厚溶液の製造への用途 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS529503B2 (en:Method) | 1977-03-16 |