JPS5291743A - Method of forming aluminummsilicon alloy membrane - Google Patents
Method of forming aluminummsilicon alloy membraneInfo
- Publication number
- JPS5291743A JPS5291743A JP845976A JP845976A JPS5291743A JP S5291743 A JPS5291743 A JP S5291743A JP 845976 A JP845976 A JP 845976A JP 845976 A JP845976 A JP 845976A JP S5291743 A JPS5291743 A JP S5291743A
- Authority
- JP
- Japan
- Prior art keywords
- aluminummsilicon
- forming
- alloy membrane
- membrane
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP845976A JPS5291743A (en) | 1976-01-30 | 1976-01-30 | Method of forming aluminummsilicon alloy membrane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP845976A JPS5291743A (en) | 1976-01-30 | 1976-01-30 | Method of forming aluminummsilicon alloy membrane |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5291743A true JPS5291743A (en) | 1977-08-02 |
Family
ID=11693706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP845976A Pending JPS5291743A (en) | 1976-01-30 | 1976-01-30 | Method of forming aluminummsilicon alloy membrane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5291743A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59136415A (ja) * | 1983-01-25 | 1984-08-06 | Sharp Corp | 高透磁率合金膜の製造方法 |
-
1976
- 1976-01-30 JP JP845976A patent/JPS5291743A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59136415A (ja) * | 1983-01-25 | 1984-08-06 | Sharp Corp | 高透磁率合金膜の製造方法 |
JPH02430B2 (ja) * | 1983-01-25 | 1990-01-08 | Sharp Kk |
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