JPS5259888A - Manufacturing of two layer transparent conduction film - Google Patents

Manufacturing of two layer transparent conduction film

Info

Publication number
JPS5259888A
JPS5259888A JP50136500A JP13650075A JPS5259888A JP S5259888 A JPS5259888 A JP S5259888A JP 50136500 A JP50136500 A JP 50136500A JP 13650075 A JP13650075 A JP 13650075A JP S5259888 A JPS5259888 A JP S5259888A
Authority
JP
Japan
Prior art keywords
conduction film
transparent conduction
manufacturing
layer transparent
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50136500A
Other languages
English (en)
Inventor
Yasuhiro Shimizu
Koichi Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP50136500A priority Critical patent/JPS5259888A/ja
Publication of JPS5259888A publication Critical patent/JPS5259888A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes

Landscapes

  • Manufacturing Of Electric Cables (AREA)
JP50136500A 1975-11-12 1975-11-12 Manufacturing of two layer transparent conduction film Pending JPS5259888A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50136500A JPS5259888A (en) 1975-11-12 1975-11-12 Manufacturing of two layer transparent conduction film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50136500A JPS5259888A (en) 1975-11-12 1975-11-12 Manufacturing of two layer transparent conduction film

Publications (1)

Publication Number Publication Date
JPS5259888A true JPS5259888A (en) 1977-05-17

Family

ID=15176607

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50136500A Pending JPS5259888A (en) 1975-11-12 1975-11-12 Manufacturing of two layer transparent conduction film

Country Status (1)

Country Link
JP (1) JPS5259888A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4336277A (en) * 1980-09-29 1982-06-22 The Regents Of The University Of California Transparent electrical conducting films by activated reactive evaporation
US4361114A (en) * 1980-10-06 1982-11-30 Optical Coating Laboratory, Inc. Method and apparatus for forming thin film oxide layers using reactive evaporation techniques
FR2520008A1 (fr) * 1982-01-21 1983-07-22 Leybold Heraeus Gmbh & Co Kg Procede pour la production, par pulverisation cathodique de cibles, de plateaux de teinte pratiquement neutre en reflexion et en transmission, et reflechissant une composante infrarouge elevee du rayonnement
JPS60205909A (ja) * 1984-03-28 1985-10-17 株式会社半導体エネルギー研究所 透光性導電膜

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4336277A (en) * 1980-09-29 1982-06-22 The Regents Of The University Of California Transparent electrical conducting films by activated reactive evaporation
US4361114A (en) * 1980-10-06 1982-11-30 Optical Coating Laboratory, Inc. Method and apparatus for forming thin film oxide layers using reactive evaporation techniques
FR2520008A1 (fr) * 1982-01-21 1983-07-22 Leybold Heraeus Gmbh & Co Kg Procede pour la production, par pulverisation cathodique de cibles, de plateaux de teinte pratiquement neutre en reflexion et en transmission, et reflechissant une composante infrarouge elevee du rayonnement
JPS60205909A (ja) * 1984-03-28 1985-10-17 株式会社半導体エネルギー研究所 透光性導電膜

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