JPS5247582A - Acteivation and reactive vacuum evaporation method - Google Patents

Acteivation and reactive vacuum evaporation method

Info

Publication number
JPS5247582A
JPS5247582A JP12294375A JP12294375A JPS5247582A JP S5247582 A JPS5247582 A JP S5247582A JP 12294375 A JP12294375 A JP 12294375A JP 12294375 A JP12294375 A JP 12294375A JP S5247582 A JPS5247582 A JP S5247582A
Authority
JP
Japan
Prior art keywords
vacuum evaporation
acteivation
evaporation method
reactive vacuum
reactive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12294375A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5418988B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Tadao Tokushima
Yoshifumi Suzuki
Hiromitsu Toda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Gakki Co Ltd
Original Assignee
Nippon Gakki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Gakki Co Ltd filed Critical Nippon Gakki Co Ltd
Priority to JP12294375A priority Critical patent/JPS5247582A/ja
Publication of JPS5247582A publication Critical patent/JPS5247582A/ja
Publication of JPS5418988B2 publication Critical patent/JPS5418988B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP12294375A 1975-10-14 1975-10-14 Acteivation and reactive vacuum evaporation method Granted JPS5247582A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12294375A JPS5247582A (en) 1975-10-14 1975-10-14 Acteivation and reactive vacuum evaporation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12294375A JPS5247582A (en) 1975-10-14 1975-10-14 Acteivation and reactive vacuum evaporation method

Publications (2)

Publication Number Publication Date
JPS5247582A true JPS5247582A (en) 1977-04-15
JPS5418988B2 JPS5418988B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1979-07-11

Family

ID=14848444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12294375A Granted JPS5247582A (en) 1975-10-14 1975-10-14 Acteivation and reactive vacuum evaporation method

Country Status (1)

Country Link
JP (1) JPS5247582A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003080890A1 (en) * 2002-03-26 2003-10-02 Matsushita Electric Industrial Co., Ltd. Production metod and production device for thin film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003080890A1 (en) * 2002-03-26 2003-10-02 Matsushita Electric Industrial Co., Ltd. Production metod and production device for thin film

Also Published As

Publication number Publication date
JPS5418988B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1979-07-11

Similar Documents

Publication Publication Date Title
GB1545461A (en) Method of attacking a thin film by decomposition of a gas in a plasma
JPS524439A (en) Phosphating process for metal
JPS5247582A (en) Acteivation and reactive vacuum evaporation method
CH610792A5 (en) Process for producing an object of coarse-grained microstructure from a superalloy, and object produced by the process
JPS51117136A (en) Plasma etching process
JPS51115734A (en) Gas electricity discharge panel drive method
JPS5254898A (en) Spattering ion source of microwave
GB1544227A (en) Vacuum plant for example vacuum vapour deposition plant
JPS548139A (en) Soldering material
JPS53135843A (en) Etching process for al and al alloy
JPS5226675A (en) Manufacturing method of edged tool with regular arc cutting edte
JPS51125619A (en) Process for producing extra low corbon steel
JPS5210872A (en) Apparatus for production of compound thin films
JPS5210866A (en) Process for production of compound thin film
JPS5230718A (en) Process for making metallic material with high toughness
JPS5216012A (en) Vacuum system
AU507110B2 (en) Phosphating process
JPS5224070A (en) Productio method of magnetron anode
JPS53114744A (en) Etching method
JPS5216421A (en) Process for production of steel with hardly causing hydrogen embrittle ment
JPS51139765A (en) Method of manufacturing secondary electron multiplication channel plate
JPS523394A (en) Piezo-vibrator
JPS51131480A (en) A process for producing self-supporting membrane
JPS527655A (en) Microwave antenna
JPS5226377A (en) Process for production of hydrogen