JPS5241050B2 - - Google Patents
Info
- Publication number
- JPS5241050B2 JPS5241050B2 JP49034285A JP3428574A JPS5241050B2 JP S5241050 B2 JPS5241050 B2 JP S5241050B2 JP 49034285 A JP49034285 A JP 49034285A JP 3428574 A JP3428574 A JP 3428574A JP S5241050 B2 JPS5241050 B2 JP S5241050B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49034285A JPS5241050B2 (US06350818-20020226-C00016.png) | 1974-03-27 | 1974-03-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49034285A JPS5241050B2 (US06350818-20020226-C00016.png) | 1974-03-27 | 1974-03-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50127619A JPS50127619A (US06350818-20020226-C00016.png) | 1975-10-07 |
| JPS5241050B2 true JPS5241050B2 (US06350818-20020226-C00016.png) | 1977-10-15 |
Family
ID=12409874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49034285A Expired JPS5241050B2 (US06350818-20020226-C00016.png) | 1974-03-27 | 1974-03-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5241050B2 (US06350818-20020226-C00016.png) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51120712A (en) * | 1975-04-15 | 1976-10-22 | Toshiba Corp | Positive type photo-resistant compound |
| DE3406927A1 (de) * | 1984-02-25 | 1985-08-29 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen |
| JPS6161154A (ja) * | 1984-09-03 | 1986-03-28 | Oki Electric Ind Co Ltd | 微細ネガレジストパターン形成方法 |
| JPH0766184B2 (ja) * | 1985-06-04 | 1995-07-19 | 住友化学工業株式会社 | ポジ型フオトレジスト組成物 |
| JP2549366B2 (ja) * | 1986-10-03 | 1996-10-30 | 三菱化学株式会社 | 感光性平版印刷版 |
| JPS6452139A (en) * | 1987-05-18 | 1989-02-28 | Konishiroku Photo Ind | Photosensitive composition |
| JP2551948B2 (ja) * | 1987-07-31 | 1996-11-06 | 三菱化学株式会社 | 感光性平版印刷版 |
| JP2693472B2 (ja) * | 1987-11-26 | 1997-12-24 | 株式会社東芝 | レジスト |
| EP0345305A4 (en) * | 1987-12-10 | 1991-10-02 | Macdermid Incorporated | Image-reversible dry-film photoresists |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL7305260A (US06350818-20020226-C00016.png) * | 1972-05-05 | 1973-11-07 |
-
1974
- 1974-03-27 JP JP49034285A patent/JPS5241050B2/ja not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL7305260A (US06350818-20020226-C00016.png) * | 1972-05-05 | 1973-11-07 | ||
| JPS4948403A (US06350818-20020226-C00016.png) * | 1972-05-05 | 1974-05-10 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS50127619A (US06350818-20020226-C00016.png) | 1975-10-07 |
