JPS5236043B2 - - Google Patents
Info
- Publication number
- JPS5236043B2 JPS5236043B2 JP49020925A JP2092574A JPS5236043B2 JP S5236043 B2 JPS5236043 B2 JP S5236043B2 JP 49020925 A JP49020925 A JP 49020925A JP 2092574 A JP2092574 A JP 2092574A JP S5236043 B2 JPS5236043 B2 JP S5236043B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F112/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F112/02—Monomers containing only one unsaturated aliphatic radical
- C08F112/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F112/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
- C08F112/22—Oxygen
- C08F112/24—Phenols or alcohols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49020925A JPS5236043B2 (US06350818-20020226-C00016.png) | 1974-02-21 | 1974-02-21 | |
| FR7505313A FR2262329B1 (US06350818-20020226-C00016.png) | 1974-02-21 | 1975-02-20 | |
| GB7230/75A GB1494043A (en) | 1974-02-21 | 1975-02-20 | Photosensitive lithographic printing plate precursors |
| DE2507548A DE2507548C2 (de) | 1974-02-21 | 1975-02-21 | Vorsensibilisierte lithographische Druckplatte und deren Verwendung zur Erzeugung von Bildern |
| CA220,777A CA1061156A (en) | 1974-02-21 | 1975-02-21 | Lithographic plate with layer of photosensitive diazo-oxide resin |
| US05/789,587 US4139384A (en) | 1974-02-21 | 1977-04-21 | Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49020925A JPS5236043B2 (US06350818-20020226-C00016.png) | 1974-02-21 | 1974-02-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50113305A JPS50113305A (US06350818-20020226-C00016.png) | 1975-09-05 |
| JPS5236043B2 true JPS5236043B2 (US06350818-20020226-C00016.png) | 1977-09-13 |
Family
ID=12040784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49020925A Expired JPS5236043B2 (US06350818-20020226-C00016.png) | 1974-02-21 | 1974-02-21 |
Country Status (5)
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2523324A1 (fr) * | 1982-03-15 | 1983-09-16 | Shipley Co | Composition pour reserve photochimique contenant un sensibilisateur diazo et une resine de polyvinylphenol et ses applications |
| EP0095388A2 (en) * | 1982-05-25 | 1983-11-30 | Sumitomo Chemical Company, Limited | Positive-type photoresist compositions |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62227143A (ja) * | 1986-03-28 | 1987-10-06 | Toshiba Corp | 感光性組成物 |
| FR2648468B1 (fr) * | 1989-05-30 | 1992-12-04 | Commissariat Energie Atomique | Composition de resine sensible aux rayonnements uv et aux electrons |
| JP2567282B2 (ja) * | 1989-10-02 | 1996-12-25 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
| DE4106356A1 (de) * | 1991-02-28 | 1992-09-03 | Hoechst Ag | Strahlungsempfindliche polymere mit naphthochinon-2-diazid-4-sulfonyl-gruppen und deren verwendung in einem positiv arbeitenden aufzeichnungsmaterial |
| JP3290316B2 (ja) | 1994-11-18 | 2002-06-10 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
| JP3506295B2 (ja) | 1995-12-22 | 2004-03-15 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
| KR100363695B1 (ko) * | 1998-12-31 | 2003-04-11 | 주식회사 하이닉스반도체 | 유기난반사방지중합체및그의제조방법 |
| US6528228B2 (en) * | 1999-12-22 | 2003-03-04 | Kodak Polychrome Graphics, Llc | Chemical resistant underlayer for positive-working printing plates |
| EP1884372B1 (en) | 2006-08-03 | 2009-10-21 | Agfa Graphics N.V. | A lithographic printing plate support |
| DE602007006822D1 (de) | 2007-11-30 | 2010-07-08 | Agfa Graphics Nv | Verfahren zur Behandlung einer Lithografiedruckplatte |
| EP2098376B1 (en) | 2008-03-04 | 2013-09-18 | Agfa Graphics N.V. | A method for making a lithographic printing plate support |
| ATE514561T1 (de) | 2008-03-31 | 2011-07-15 | Agfa Graphics Nv | Verfahren zur behandlung einer lithografischen druckplatte |
| EP3032334B1 (en) | 2014-12-08 | 2017-10-18 | Agfa Graphics Nv | A system for reducing ablation debris |
| US20190079406A1 (en) | 2016-03-16 | 2019-03-14 | Agfa Nv | Method for processing a lithographic printing plate |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
| CN112650023B (zh) * | 2020-12-23 | 2023-07-14 | 上海彤程电子材料有限公司 | 一种高分辨率光刻胶组合物及其应用 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1375461A (US06350818-20020226-C00016.png) * | 1972-05-05 | 1974-11-27 |
-
1974
- 1974-02-21 JP JP49020925A patent/JPS5236043B2/ja not_active Expired
-
1975
- 1975-02-20 GB GB7230/75A patent/GB1494043A/en not_active Expired
- 1975-02-20 FR FR7505313A patent/FR2262329B1/fr not_active Expired
- 1975-02-21 CA CA220,777A patent/CA1061156A/en not_active Expired
- 1975-02-21 DE DE2507548A patent/DE2507548C2/de not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2523324A1 (fr) * | 1982-03-15 | 1983-09-16 | Shipley Co | Composition pour reserve photochimique contenant un sensibilisateur diazo et une resine de polyvinylphenol et ses applications |
| EP0095388A2 (en) * | 1982-05-25 | 1983-11-30 | Sumitomo Chemical Company, Limited | Positive-type photoresist compositions |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2262329B1 (US06350818-20020226-C00016.png) | 1977-04-15 |
| JPS50113305A (US06350818-20020226-C00016.png) | 1975-09-05 |
| CA1061156A (en) | 1979-08-28 |
| FR2262329A1 (US06350818-20020226-C00016.png) | 1975-09-19 |
| GB1494043A (en) | 1977-12-07 |
| DE2507548A1 (de) | 1975-09-04 |
| DE2507548C2 (de) | 1984-10-11 |
