JPS5233526B1 - - Google Patents

Info

Publication number
JPS5233526B1
JPS5233526B1 JP46060349A JP6034971A JPS5233526B1 JP S5233526 B1 JPS5233526 B1 JP S5233526B1 JP 46060349 A JP46060349 A JP 46060349A JP 6034971 A JP6034971 A JP 6034971A JP S5233526 B1 JPS5233526 B1 JP S5233526B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP46060349A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5233526B1 publication Critical patent/JPS5233526B1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00—Compounds containing azido groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP46060349A 1970-09-29 1971-08-11 Pending JPS5233526B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7639870A 1970-09-29 1970-09-29

Publications (1)

Publication Number Publication Date
JPS5233526B1 true JPS5233526B1 (ja) 1977-08-29

Family

ID=22131764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP46060349A Pending JPS5233526B1 (ja) 1970-09-29 1971-08-11

Country Status (5)

Country Link
US (1) US3695886A (ja)
JP (1) JPS5233526B1 (ja)
DE (1) DE2148216A1 (ja)
FR (1) FR2105825A5 (ja)
GB (1) GB1366328A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018197524A1 (en) 2017-04-28 2018-11-01 Merck Patent Gmbh Positive type photosensitive siloxane composition and cured film formed by using the same
WO2018197535A1 (en) 2017-04-28 2018-11-01 Merck Patent Gmbh Positive type photosensitive siloxane composition and cured film formed by using the same

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4191571A (en) * 1974-04-26 1980-03-04 Hitachi, Ltd. Method of pattern forming in a photosensitive composition having a reciprocity law failing property
US4702990A (en) * 1984-05-14 1987-10-27 Nippon Telegraph And Telephone Corporation Photosensitive resin composition and process for forming photo-resist pattern using the same
KR980010618A (ko) * 1996-07-16 1998-04-30 손욱 포토레지스트 조성물
EP1348690A1 (en) 2002-03-29 2003-10-01 Toyo Gosei Kogyo Co., Ltd. Cinnamaldehyde compound having an azido group

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018197524A1 (en) 2017-04-28 2018-11-01 Merck Patent Gmbh Positive type photosensitive siloxane composition and cured film formed by using the same
WO2018197535A1 (en) 2017-04-28 2018-11-01 Merck Patent Gmbh Positive type photosensitive siloxane composition and cured film formed by using the same

Also Published As

Publication number Publication date
US3695886A (en) 1972-10-03
GB1366328A (en) 1974-09-11
FR2105825A5 (ja) 1972-04-28
DE2148216A1 (de) 1972-03-30

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