FR2105825A5 - - Google Patents

Info

Publication number
FR2105825A5
FR2105825A5 FR7127194A FR7127194A FR2105825A5 FR 2105825 A5 FR2105825 A5 FR 2105825A5 FR 7127194 A FR7127194 A FR 7127194A FR 7127194 A FR7127194 A FR 7127194A FR 2105825 A5 FR2105825 A5 FR 2105825A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7127194A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of FR2105825A5 publication Critical patent/FR2105825A5/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00—Compounds containing azido groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
FR7127194A 1970-09-29 1971-07-20 Expired FR2105825A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7639870A 1970-09-29 1970-09-29

Publications (1)

Publication Number Publication Date
FR2105825A5 true FR2105825A5 (fr) 1972-04-28

Family

ID=22131764

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7127194A Expired FR2105825A5 (fr) 1970-09-29 1971-07-20

Country Status (5)

Country Link
US (1) US3695886A (fr)
JP (1) JPS5233526B1 (fr)
DE (1) DE2148216A1 (fr)
FR (1) FR2105825A5 (fr)
GB (1) GB1366328A (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4191571A (en) * 1974-04-26 1980-03-04 Hitachi, Ltd. Method of pattern forming in a photosensitive composition having a reciprocity law failing property
US4702990A (en) * 1984-05-14 1987-10-27 Nippon Telegraph And Telephone Corporation Photosensitive resin composition and process for forming photo-resist pattern using the same
KR980010618A (ko) * 1996-07-16 1998-04-30 손욱 포토레지스트 조성물
EP1348690A1 (fr) 2002-03-29 2003-10-01 Toyo Gosei Kogyo Co., Ltd. Cinnamaldéhyde composé avec un groupe azido
JP2018189732A (ja) 2017-04-28 2018-11-29 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ ポジ型感光性シロキサン組成物、およびそれを用いて形成した硬化膜
JP2018189738A (ja) 2017-04-28 2018-11-29 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ ポジ型感光性シロキサン組成物、およびそれを用いて形成した硬化膜

Also Published As

Publication number Publication date
US3695886A (en) 1972-10-03
JPS5233526B1 (fr) 1977-08-29
GB1366328A (en) 1974-09-11
DE2148216A1 (de) 1972-03-30

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Legal Events

Date Code Title Description
ST Notification of lapse