JPS5231147B2 - - Google Patents
Info
- Publication number
 - JPS5231147B2 JPS5231147B2 JP3340373A JP3340373A JPS5231147B2 JP S5231147 B2 JPS5231147 B2 JP S5231147B2 JP 3340373 A JP3340373 A JP 3340373A JP 3340373 A JP3340373 A JP 3340373A JP S5231147 B2 JPS5231147 B2 JP S5231147B2
 - Authority
 - JP
 - Japan
 - Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
 - Expired
 
Links
Classifications
- 
        
- H—ELECTRICITY
 - H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
 - H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
 - H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
 - H10H20/80—Constructional details
 - H10H20/81—Bodies
 - H10H20/822—Materials of the light-emitting regions
 - H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
 - H10H20/8242—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP characterised by the dopants
 
 - 
        
- H—ELECTRICITY
 - H01—ELECTRIC ELEMENTS
 - H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
 - H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
 - H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
 - H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
 - H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
 - H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
 - H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
 - H01L21/2258—Diffusion into or out of AIIIBV compounds
 
 - 
        
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
 - Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10S148/00—Metal treatment
 - Y10S148/049—Equivalence and options
 
 - 
        
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
 - Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10S148/00—Metal treatment
 - Y10S148/056—Gallium arsenide
 
 - 
        
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
 - Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10S148/00—Metal treatment
 - Y10S148/065—Gp III-V generic compounds-processing
 
 - 
        
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
 - Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10S148/00—Metal treatment
 - Y10S148/106—Masks, special
 
 - 
        
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
 - Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10S438/00—Semiconductor device manufacturing: process
 - Y10S438/914—Doping
 - Y10S438/923—Diffusion through a layer
 
 - 
        
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
 - Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10S438/00—Semiconductor device manufacturing: process
 - Y10S438/971—Stoichiometric control of host substrate composition
 
 
Landscapes
- Engineering & Computer Science (AREA)
 - Physics & Mathematics (AREA)
 - Condensed Matter Physics & Semiconductors (AREA)
 - General Physics & Mathematics (AREA)
 - Manufacturing & Machinery (AREA)
 - Computer Hardware Design (AREA)
 - Microelectronics & Electronic Packaging (AREA)
 - Power Engineering (AREA)
 - Led Devices (AREA)
 - Crystals, And After-Treatments Of Crystals (AREA)
 - Recrystallisation Techniques (AREA)
 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| DE2214224A DE2214224C3 (de) | 1972-03-23 | 1972-03-23 | Verfahren zur Bildung von pn-Übergängen in III-V-Halbleiter-Einkristallen | 
Publications (2)
| Publication Number | Publication Date | 
|---|---|
| JPS499184A JPS499184A (forum.php) | 1974-01-26 | 
| JPS5231147B2 true JPS5231147B2 (forum.php) | 1977-08-12 | 
Family
ID=5839948
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP3340373A Expired JPS5231147B2 (forum.php) | 1972-03-23 | 1973-03-23 | 
Country Status (11)
| Country | Link | 
|---|---|
| US (1) | US3925121A (forum.php) | 
| JP (1) | JPS5231147B2 (forum.php) | 
| AT (1) | AT317316B (forum.php) | 
| CA (1) | CA1002433A (forum.php) | 
| CH (1) | CH576808A5 (forum.php) | 
| DE (1) | DE2214224C3 (forum.php) | 
| FR (1) | FR2176669B1 (forum.php) | 
| GB (1) | GB1388641A (forum.php) | 
| IT (1) | IT981579B (forum.php) | 
| NL (1) | NL7217305A (forum.php) | 
| SE (1) | SE378156B (forum.php) | 
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS62441U (forum.php) * | 1985-06-20 | 1987-01-06 | 
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| US4099997A (en) * | 1976-06-21 | 1978-07-11 | Rca Corporation | Method of fabricating a semiconductor device | 
| JPS6030204Y2 (ja) * | 1981-07-29 | 1985-09-11 | 東京パ−ツ株式会社 | ブラシ付蓋を有する粘性液用容器 | 
| JPS6057923A (ja) * | 1983-09-09 | 1985-04-03 | Nippon Telegr & Teleph Corp <Ntt> | 化合物半導体結晶の均質化方法 | 
| US4502898A (en) * | 1983-12-21 | 1985-03-05 | At&T Bell Laboratories | Diffusion procedure for semiconductor compound | 
| US4634474A (en) * | 1984-10-09 | 1987-01-06 | At&T Bell Laboratories | Coating of III-V and II-VI compound semiconductors | 
| US5076860A (en) * | 1989-01-13 | 1991-12-31 | Kabushiki Kaisha Toshiba | Algan compound semiconductor material | 
| US6297538B1 (en) | 1998-03-23 | 2001-10-02 | The University Of Delaware | Metal-insulator-semiconductor field effect transistor having an oxidized aluminum nitride gate insulator formed on a gallium nitride or silicon substrate | 
| US7439609B2 (en) * | 2004-03-29 | 2008-10-21 | Cree, Inc. | Doping of gallium nitride by solid source diffusion and resulting gallium nitride structures | 
| US9275854B2 (en) * | 2013-08-07 | 2016-03-01 | Globalfoundries Inc. | Compound semiconductor integrated circuit and method to fabricate same | 
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| US3245847A (en) * | 1962-11-19 | 1966-04-12 | Hughes Aircraft Co | Method of producing stable gallium arsenide and semiconductor diodes made therefrom | 
| US3255056A (en) * | 1963-05-20 | 1966-06-07 | Rca Corp | Method of forming semiconductor junction | 
| US3298879A (en) * | 1964-03-23 | 1967-01-17 | Rca Corp | Method of fabricating a semiconductor by masking | 
| US3408238A (en) * | 1965-06-02 | 1968-10-29 | Texas Instruments Inc | Use of both silicon oxide and phosphorus oxide to mask against diffusion of indium or gallium into germanium semiconductor device | 
| US3422322A (en) * | 1965-08-25 | 1969-01-14 | Texas Instruments Inc | Drift transistor | 
| GB1098564A (en) * | 1966-09-20 | 1968-01-10 | Standard Telephones Cables Ltd | A method for producing gallium arsenide devices | 
| US3537921A (en) * | 1967-02-28 | 1970-11-03 | Motorola Inc | Selective hydrofluoric acid etching and subsequent processing | 
| JPS4915903B1 (forum.php) * | 1969-08-18 | 1974-04-18 | ||
| US3660156A (en) * | 1970-08-19 | 1972-05-02 | Monsanto Co | Semiconductor doping compositions | 
- 
        1972
        
- 1972-03-23 DE DE2214224A patent/DE2214224C3/de not_active Expired
 - 1972-12-07 AT AT1046072A patent/AT317316B/de not_active IP Right Cessation
 - 1972-12-19 NL NL7217305A patent/NL7217305A/xx unknown
 - 1972-12-26 FR FR7246171A patent/FR2176669B1/fr not_active Expired
 
 - 
        1973
        
- 1973-01-01 GB GB9773A patent/GB1388641A/en not_active Expired
 - 1973-01-19 CH CH76173A patent/CH576808A5/xx not_active IP Right Cessation
 - 1973-03-08 US US339218A patent/US3925121A/en not_active Expired - Lifetime
 - 1973-03-15 CA CA166,196A patent/CA1002433A/en not_active Expired
 - 1973-03-22 IT IT21963/73A patent/IT981579B/it active
 - 1973-03-23 JP JP3340373A patent/JPS5231147B2/ja not_active Expired
 - 1973-03-23 SE SE7304137A patent/SE378156B/xx unknown
 
 
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS62441U (forum.php) * | 1985-06-20 | 1987-01-06 | 
Also Published As
| Publication number | Publication date | 
|---|---|
| FR2176669B1 (forum.php) | 1977-02-25 | 
| CA1002433A (en) | 1976-12-28 | 
| CH576808A5 (forum.php) | 1976-06-30 | 
| SE378156B (forum.php) | 1975-08-18 | 
| USB339218I5 (forum.php) | 1975-01-28 | 
| AT317316B (de) | 1974-08-26 | 
| NL7217305A (forum.php) | 1973-09-25 | 
| DE2214224C3 (de) | 1978-05-03 | 
| IT981579B (it) | 1974-10-10 | 
| DE2214224B2 (de) | 1977-09-08 | 
| GB1388641A (en) | 1975-03-26 | 
| US3925121A (en) | 1975-12-09 | 
| FR2176669A1 (forum.php) | 1973-11-02 | 
| JPS499184A (forum.php) | 1974-01-26 | 
| DE2214224A1 (de) | 1973-10-04 |