JPS5230851B2 - - Google Patents
Info
- Publication number
- JPS5230851B2 JPS5230851B2 JP49117280A JP11728074A JPS5230851B2 JP S5230851 B2 JPS5230851 B2 JP S5230851B2 JP 49117280 A JP49117280 A JP 49117280A JP 11728074 A JP11728074 A JP 11728074A JP S5230851 B2 JPS5230851 B2 JP S5230851B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
- G03C5/40—Chemically transforming developed images
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- ing And Chemical Polishing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Drying Of Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49117280A JPS5230851B2 (ja) | 1974-10-11 | 1974-10-11 | |
DE19752545570 DE2545570A1 (de) | 1974-10-11 | 1975-10-10 | Bildaufzeichnungsverfahren |
NL7511939A NL7511939A (nl) | 1974-10-11 | 1975-10-10 | Beeldvormingswerkwijze, alsmede volgens deze werkwijze verkregen afbeeldingen. |
US05/622,330 US4110114A (en) | 1974-10-11 | 1975-10-14 | Image forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49117280A JPS5230851B2 (ja) | 1974-10-11 | 1974-10-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5143141A JPS5143141A (ja) | 1976-04-13 |
JPS5230851B2 true JPS5230851B2 (ja) | 1977-08-11 |
Family
ID=14707825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP49117280A Expired JPS5230851B2 (ja) | 1974-10-11 | 1974-10-11 |
Country Status (4)
Country | Link |
---|---|
US (1) | US4110114A (ja) |
JP (1) | JPS5230851B2 (ja) |
DE (1) | DE2545570A1 (ja) |
NL (1) | NL7511939A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019012933A1 (ja) | 2017-07-13 | 2019-01-17 | 日立建機株式会社 | 積載量補正システム |
KR20200038884A (ko) * | 2017-08-08 | 2020-04-14 | 스미토모 겐키 가부시키가이샤 | 쇼벨 및 쇼벨의 지원장치 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5428136A (en) * | 1977-08-03 | 1979-03-02 | Fuji Photo Film Co Ltd | Manufacture of durable photomask |
US4401750A (en) * | 1981-11-16 | 1983-08-30 | Jerrold Goldberg | Etched photographic imagery |
JPS62228711A (ja) * | 1986-03-27 | 1987-10-07 | Nissin Kogyo Kk | ベアリング装置の製造方法 |
US5932024A (en) * | 1997-07-01 | 1999-08-03 | Moore; Jesse C. | Decoating titanium and other metallized glass surfaces |
US7137190B2 (en) | 2002-10-03 | 2006-11-21 | Hitachi Global Storage Technologies Netherlands B.V. | Method for fabricating a magnetic transducer with a corrosion resistant layer on metallic thin films by nitrogen exposure |
US6804879B2 (en) * | 2002-10-23 | 2004-10-19 | Hitachi Global Storage Technologies Netherlands, B.V. | Method of fabricating a magnetic transducer with a write head having a multi-layer coil |
CN103717403B (zh) * | 2011-08-10 | 2016-08-31 | 太阳诱电化学科技株式会社 | 包含薄底漆膜的结构体和包含薄底漆膜的镂空版印刷版 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3576630A (en) * | 1966-10-29 | 1971-04-27 | Nippon Electric Co | Photo-etching process |
US3639125A (en) * | 1969-01-10 | 1972-02-01 | Ibm | Process for producing photographic relief patterns |
US3860783A (en) * | 1970-10-19 | 1975-01-14 | Bell Telephone Labor Inc | Ion etching through a pattern mask |
US3664942A (en) * | 1970-12-31 | 1972-05-23 | Ibm | End point detection method and apparatus for sputter etching |
US3733258A (en) * | 1971-02-03 | 1973-05-15 | Rca Corp | Sputter-etching technique for recording holograms or other fine-detail relief patterns in hard durable materials |
JPS5146001B2 (ja) * | 1971-09-20 | 1976-12-07 | ||
BE792499A (fr) * | 1971-12-10 | 1973-03-30 | Siemens Ag | Procede de traitement pour le blanchiment par attaque chimique de plaques photographiques et de films exposes et |
US3873361A (en) * | 1973-11-29 | 1975-03-25 | Ibm | Method of depositing thin film utilizing a lift-off mask |
-
1974
- 1974-10-11 JP JP49117280A patent/JPS5230851B2/ja not_active Expired
-
1975
- 1975-10-10 DE DE19752545570 patent/DE2545570A1/de not_active Withdrawn
- 1975-10-10 NL NL7511939A patent/NL7511939A/xx not_active Application Discontinuation
- 1975-10-14 US US05/622,330 patent/US4110114A/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019012933A1 (ja) | 2017-07-13 | 2019-01-17 | 日立建機株式会社 | 積載量補正システム |
KR20190115056A (ko) | 2017-07-13 | 2019-10-10 | 히다치 겡키 가부시키 가이샤 | 적재량 보정 시스템 |
KR20200038884A (ko) * | 2017-08-08 | 2020-04-14 | 스미토모 겐키 가부시키가이샤 | 쇼벨 및 쇼벨의 지원장치 |
Also Published As
Publication number | Publication date |
---|---|
DE2545570A1 (de) | 1976-04-22 |
NL7511939A (nl) | 1976-04-13 |
US4110114A (en) | 1978-08-29 |
JPS5143141A (ja) | 1976-04-13 |