JPS5227561B2 - - Google Patents

Info

Publication number
JPS5227561B2
JPS5227561B2 JP1916472A JP1916472A JPS5227561B2 JP S5227561 B2 JPS5227561 B2 JP S5227561B2 JP 1916472 A JP1916472 A JP 1916472A JP 1916472 A JP1916472 A JP 1916472A JP S5227561 B2 JPS5227561 B2 JP S5227561B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1916472A
Other languages
Japanese (ja)
Other versions
JPS4887903A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to BE795857D priority Critical patent/BE795857A/en
Application filed filed Critical
Priority to JP1916472A priority patent/JPS5227561B2/ja
Priority to AU52505/73A priority patent/AU461796B2/en
Priority to FR7306600A priority patent/FR2173622A6/en
Publication of JPS4887903A publication Critical patent/JPS4887903A/ja
Publication of JPS5227561B2 publication Critical patent/JPS5227561B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP1916472A 1972-02-24 1972-02-24 Expired JPS5227561B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
BE795857D BE795857A (en) 1972-02-24 PROCESS FOR PRODUCING PHOTOPOLYMERIC PRINTING PLATES AND PRODUCTS OBTAINED
JP1916472A JPS5227561B2 (en) 1972-02-24 1972-02-24
AU52505/73A AU461796B2 (en) 1972-02-24 1973-02-22 Photopolymer printing plate
FR7306600A FR2173622A6 (en) 1972-02-24 1973-02-23 Water developable photopolymerisable compsns - - contg ethylenic monomer, benzoin initiator and polyvinyl acetate gi

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1916472A JPS5227561B2 (en) 1972-02-24 1972-02-24

Publications (2)

Publication Number Publication Date
JPS4887903A JPS4887903A (en) 1973-11-19
JPS5227561B2 true JPS5227561B2 (en) 1977-07-21

Family

ID=11991728

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1916472A Expired JPS5227561B2 (en) 1972-02-24 1972-02-24

Country Status (4)

Country Link
JP (1) JPS5227561B2 (en)
AU (1) AU461796B2 (en)
BE (1) BE795857A (en)
FR (1) FR2173622A6 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5412735A (en) * 1977-06-30 1979-01-30 Toshiba Corp Photoetching of metal plate
JPS56131609A (en) * 1980-03-21 1981-10-15 Nippon Synthetic Chem Ind Co Ltd:The Photocurable liquid resin composition
JPS58127922A (en) * 1982-01-26 1983-07-30 Toray Ind Inc Photosensitive resin composition
JPS58176203A (en) * 1982-04-12 1983-10-15 Shin Etsu Chem Co Ltd Photopolymerizable composition
JPS59107343A (en) * 1982-12-13 1984-06-21 Murakami Screen Kk Photosensitive resin composition
JPS6010245A (en) * 1983-06-30 1985-01-19 Agency Of Ind Science & Technol Photosensitive resin composition
JPH01233442A (en) * 1988-03-14 1989-09-19 Kuraray Co Ltd Photosensitive resin composition
JP2613462B2 (en) * 1988-12-28 1997-05-28 コニカ株式会社 Image forming material and image forming method
JP4647444B2 (en) * 2005-09-16 2011-03-09 東京応化工業株式会社 Water-soluble photosensitive resin composition for flexographic printing plate and water-soluble photosensitive flexographic printing plate

Also Published As

Publication number Publication date
AU461796B2 (en) 1975-06-05
FR2173622A6 (en) 1973-10-05
BE795857A (en) 1973-08-23
AU5250573A (en) 1974-08-22
JPS4887903A (en) 1973-11-19

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