JPS52136577A - Aligning device - Google Patents
Aligning deviceInfo
- Publication number
- JPS52136577A JPS52136577A JP5281876A JP5281876A JPS52136577A JP S52136577 A JPS52136577 A JP S52136577A JP 5281876 A JP5281876 A JP 5281876A JP 5281876 A JP5281876 A JP 5281876A JP S52136577 A JPS52136577 A JP S52136577A
- Authority
- JP
- Japan
- Prior art keywords
- aligning device
- aligning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5281876A JPS52136577A (en) | 1976-05-11 | 1976-05-11 | Aligning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5281876A JPS52136577A (en) | 1976-05-11 | 1976-05-11 | Aligning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52136577A true JPS52136577A (en) | 1977-11-15 |
| JPS5546053B2 JPS5546053B2 (enExample) | 1980-11-21 |
Family
ID=12925411
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5281876A Granted JPS52136577A (en) | 1976-05-11 | 1976-05-11 | Aligning device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52136577A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54145478A (en) * | 1978-05-04 | 1979-11-13 | Nippon Telegr & Teleph Corp <Ntt> | Relative positioning method for wafer and exposure mask |
| JPS5729139U (enExample) * | 1981-04-30 | 1982-02-16 | ||
| JPS62115164A (ja) * | 1985-11-14 | 1987-05-26 | Hitachi Ltd | パタン形成方法およびその装置 |
| JP2007512694A (ja) * | 2003-11-28 | 2007-05-17 | ズス・マイクロテック・リソグラフィ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング | マスク位置調節装置における直接的アライメント |
| JP2010093217A (ja) * | 2008-10-03 | 2010-04-22 | National Chiao Tung Univ | 液浸傾斜リソグラフィ装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4959576A (enExample) * | 1972-06-29 | 1974-06-10 | ||
| JPS5057778A (enExample) * | 1973-09-17 | 1975-05-20 |
-
1976
- 1976-05-11 JP JP5281876A patent/JPS52136577A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4959576A (enExample) * | 1972-06-29 | 1974-06-10 | ||
| JPS5057778A (enExample) * | 1973-09-17 | 1975-05-20 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54145478A (en) * | 1978-05-04 | 1979-11-13 | Nippon Telegr & Teleph Corp <Ntt> | Relative positioning method for wafer and exposure mask |
| JPS5729139U (enExample) * | 1981-04-30 | 1982-02-16 | ||
| JPS62115164A (ja) * | 1985-11-14 | 1987-05-26 | Hitachi Ltd | パタン形成方法およびその装置 |
| JP2007512694A (ja) * | 2003-11-28 | 2007-05-17 | ズス・マイクロテック・リソグラフィ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング | マスク位置調節装置における直接的アライメント |
| JP2010093217A (ja) * | 2008-10-03 | 2010-04-22 | National Chiao Tung Univ | 液浸傾斜リソグラフィ装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5546053B2 (enExample) | 1980-11-21 |
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