JPS52136574A - Cvd apparatus - Google Patents
Cvd apparatusInfo
- Publication number
- JPS52136574A JPS52136574A JP5345976A JP5345976A JPS52136574A JP S52136574 A JPS52136574 A JP S52136574A JP 5345976 A JP5345976 A JP 5345976A JP 5345976 A JP5345976 A JP 5345976A JP S52136574 A JPS52136574 A JP S52136574A
- Authority
- JP
- Japan
- Prior art keywords
- cvd apparatus
- pedestal
- variation
- reduce
- film obtained
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5345976A JPS52136574A (en) | 1976-05-10 | 1976-05-10 | Cvd apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5345976A JPS52136574A (en) | 1976-05-10 | 1976-05-10 | Cvd apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52136574A true JPS52136574A (en) | 1977-11-15 |
JPS5549412B2 JPS5549412B2 (enrdf_load_stackoverflow) | 1980-12-11 |
Family
ID=12943435
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5345976A Granted JPS52136574A (en) | 1976-05-10 | 1976-05-10 | Cvd apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52136574A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008089627A (ja) * | 2006-09-29 | 2008-04-17 | Mitsuba Corp | 車両用ホーン |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58165982U (ja) * | 1982-04-30 | 1983-11-05 | 矢崎総業株式会社 | 雄型電気接続子 |
JPH01145060U (enrdf_load_stackoverflow) * | 1988-03-30 | 1989-10-05 | ||
JPH0337769U (enrdf_load_stackoverflow) * | 1989-08-23 | 1991-04-11 | ||
JPH0487176U (enrdf_load_stackoverflow) * | 1990-11-30 | 1992-07-29 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5018471A (enrdf_load_stackoverflow) * | 1973-05-31 | 1975-02-26 |
-
1976
- 1976-05-10 JP JP5345976A patent/JPS52136574A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5018471A (enrdf_load_stackoverflow) * | 1973-05-31 | 1975-02-26 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008089627A (ja) * | 2006-09-29 | 2008-04-17 | Mitsuba Corp | 車両用ホーン |
Also Published As
Publication number | Publication date |
---|---|
JPS5549412B2 (enrdf_load_stackoverflow) | 1980-12-11 |
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