JPS52136573A - Cvd apparatus - Google Patents
Cvd apparatusInfo
- Publication number
- JPS52136573A JPS52136573A JP5345876A JP5345876A JPS52136573A JP S52136573 A JPS52136573 A JP S52136573A JP 5345876 A JP5345876 A JP 5345876A JP 5345876 A JP5345876 A JP 5345876A JP S52136573 A JPS52136573 A JP S52136573A
- Authority
- JP
- Japan
- Prior art keywords
- cvd apparatus
- susceptor
- evenness
- thickness
- achieve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5345876A JPS52136573A (en) | 1976-05-10 | 1976-05-10 | Cvd apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5345876A JPS52136573A (en) | 1976-05-10 | 1976-05-10 | Cvd apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52136573A true JPS52136573A (en) | 1977-11-15 |
| JPS5528546B2 JPS5528546B2 (enrdf_load_stackoverflow) | 1980-07-29 |
Family
ID=12943405
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5345876A Granted JPS52136573A (en) | 1976-05-10 | 1976-05-10 | Cvd apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52136573A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63180921U (enrdf_load_stackoverflow) * | 1987-05-13 | 1988-11-22 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5763776U (enrdf_load_stackoverflow) * | 1980-10-02 | 1982-04-15 |
-
1976
- 1976-05-10 JP JP5345876A patent/JPS52136573A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63180921U (enrdf_load_stackoverflow) * | 1987-05-13 | 1988-11-22 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5528546B2 (enrdf_load_stackoverflow) | 1980-07-29 |
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