JPS52131197A - Manufacturing method of transparent electrode - Google Patents

Manufacturing method of transparent electrode

Info

Publication number
JPS52131197A
JPS52131197A JP4771876A JP4771876A JPS52131197A JP S52131197 A JPS52131197 A JP S52131197A JP 4771876 A JP4771876 A JP 4771876A JP 4771876 A JP4771876 A JP 4771876A JP S52131197 A JPS52131197 A JP S52131197A
Authority
JP
Japan
Prior art keywords
manufacturing
transparent electrode
sno2
nessa
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4771876A
Other languages
Japanese (ja)
Inventor
Saburo Adaka
Tadashi Suda
Kiyohisa Inao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4771876A priority Critical patent/JPS52131197A/en
Publication of JPS52131197A publication Critical patent/JPS52131197A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/407Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Manufacturing Of Electric Cables (AREA)

Abstract

PURPOSE:To obtain SnO2 nessa film having a predetermined thrickness even if the temperature distribution in a substrate may be uneven by adding hydrate such as SnCl4. Xh2O in a process forming SnO2 nessa film, in a CSD method for SNO2.
JP4771876A 1976-04-28 1976-04-28 Manufacturing method of transparent electrode Pending JPS52131197A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4771876A JPS52131197A (en) 1976-04-28 1976-04-28 Manufacturing method of transparent electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4771876A JPS52131197A (en) 1976-04-28 1976-04-28 Manufacturing method of transparent electrode

Publications (1)

Publication Number Publication Date
JPS52131197A true JPS52131197A (en) 1977-11-02

Family

ID=12783082

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4771876A Pending JPS52131197A (en) 1976-04-28 1976-04-28 Manufacturing method of transparent electrode

Country Status (1)

Country Link
JP (1) JPS52131197A (en)

Similar Documents

Publication Publication Date Title
GB2018833B (en) Sputter process for manufacturing fuel cell electrodes
JPS51139285A (en) Method of altering articles by master slice system
JPS52115785A (en) Process for coating substrate
JPS5384597A (en) Manufacture for display unit
DE3066818D1 (en) Photoresist films, processes for their production and process for modifying substrate surfaces
JPS52131197A (en) Manufacturing method of transparent electrode
JPS5222895A (en) Display panel manufacturing system
JPS52143761A (en) Crystal growth method
JPS5218199A (en) Liquid crystal display element process
JPS5335198A (en) Manufacturing process of ferroelectric thin films
JPS5210692A (en) Crystalline liquid indicator cell
JPS5277584A (en) Growing crystal
JPS5280142A (en) Production of display unit
JPS5382436A (en) Production of panels for liquid crystal
JPS51143892A (en) Process for forming a transparent conductive film
JPS5210744A (en) Process of an electro-optic ceramics
JPS5218500A (en) Process for production of photoconductive electro-optical single crist al
JPS52153412A (en) Production of electric substrate
JPS5434256A (en) Production of liquid crystal display element
JPS51117648A (en) Liquid crystal indicator
JPS542094A (en) Manufacuture of substrate for liquid crystal cell
JPS5336258A (en) Production of liquid crystal cell
JPS52152881A (en) Controller of film thickness in equipment for forming coated film
JPS53131794A (en) Electrode forming method of tuning fork type crystal vibrator
JPS5225599A (en) Display unit