JPS52143761A - Crystal growth method - Google Patents
Crystal growth methodInfo
- Publication number
- JPS52143761A JPS52143761A JP6001576A JP6001576A JPS52143761A JP S52143761 A JPS52143761 A JP S52143761A JP 6001576 A JP6001576 A JP 6001576A JP 6001576 A JP6001576 A JP 6001576A JP S52143761 A JPS52143761 A JP S52143761A
- Authority
- JP
- Japan
- Prior art keywords
- crystal growth
- growth method
- grating
- crystal
- eptaxially
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
PURPOSE: To eptaxially grow satisfactory crystal only on the portions encircled by each grating by covering part of substrate crystal in grating form with an insulator, etc.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6001576A JPS52143761A (en) | 1976-05-26 | 1976-05-26 | Crystal growth method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6001576A JPS52143761A (en) | 1976-05-26 | 1976-05-26 | Crystal growth method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52143761A true JPS52143761A (en) | 1977-11-30 |
Family
ID=13129805
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6001576A Pending JPS52143761A (en) | 1976-05-26 | 1976-05-26 | Crystal growth method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52143761A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59167028A (en) * | 1983-03-11 | 1984-09-20 | Mitsubishi Electric Corp | Manufacture of compound semiconductor integrated circuit device |
JPS6325295A (en) * | 1986-07-16 | 1988-02-02 | Hitachi Cable Ltd | Semiconductor epitaxial wafer |
JPS6453411A (en) * | 1987-05-20 | 1989-03-01 | Nec Corp | Manufacture of semiconductor thin film |
WO1990011391A1 (en) * | 1989-03-17 | 1990-10-04 | Sumitomo Electric Industries, Ltd. | Wafer of compound semiconductor |
US5212394A (en) * | 1989-03-17 | 1993-05-18 | Sumitomo Electric Industries, Ltd. | Compound semiconductor wafer with defects propagating prevention means |
-
1976
- 1976-05-26 JP JP6001576A patent/JPS52143761A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59167028A (en) * | 1983-03-11 | 1984-09-20 | Mitsubishi Electric Corp | Manufacture of compound semiconductor integrated circuit device |
JPS6325295A (en) * | 1986-07-16 | 1988-02-02 | Hitachi Cable Ltd | Semiconductor epitaxial wafer |
JPS6453411A (en) * | 1987-05-20 | 1989-03-01 | Nec Corp | Manufacture of semiconductor thin film |
WO1990011391A1 (en) * | 1989-03-17 | 1990-10-04 | Sumitomo Electric Industries, Ltd. | Wafer of compound semiconductor |
US5212394A (en) * | 1989-03-17 | 1993-05-18 | Sumitomo Electric Industries, Ltd. | Compound semiconductor wafer with defects propagating prevention means |
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