JPS5190500A - - Google Patents
Info
- Publication number
- JPS5190500A JPS5190500A JP50015663A JP1566375A JPS5190500A JP S5190500 A JPS5190500 A JP S5190500A JP 50015663 A JP50015663 A JP 50015663A JP 1566375 A JP1566375 A JP 1566375A JP S5190500 A JPS5190500 A JP S5190500A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Formation Of Insulating Films (AREA)
- Inorganic Insulating Materials (AREA)
- Chemical Vapour Deposition (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50015663A JPS587058B2 (ja) | 1975-02-05 | 1975-02-05 | サンカケイソハクマクノ セイゾウホウホウ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50015663A JPS587058B2 (ja) | 1975-02-05 | 1975-02-05 | サンカケイソハクマクノ セイゾウホウホウ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5190500A true JPS5190500A (enrdf_load_html_response) | 1976-08-07 |
JPS587058B2 JPS587058B2 (ja) | 1983-02-08 |
Family
ID=11894967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50015663A Expired JPS587058B2 (ja) | 1975-02-05 | 1975-02-05 | サンカケイソハクマクノ セイゾウホウホウ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS587058B2 (enrdf_load_html_response) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5890731A (ja) * | 1981-11-25 | 1983-05-30 | Sony Corp | 感光性高分子膜形成用プラズマ処理装置 |
JPS58122736A (ja) * | 1982-01-14 | 1983-07-21 | Nippon Telegr & Teleph Corp <Ntt> | 絶縁膜形成法 |
JPS6184836A (ja) * | 1984-10-02 | 1986-04-30 | Dainippon Screen Mfg Co Ltd | 薄膜形成方法 |
-
1975
- 1975-02-05 JP JP50015663A patent/JPS587058B2/ja not_active Expired
Non-Patent Citations (1)
Title |
---|
JOURNAL OF ELECTROCHEMICAL SOCIETY=1966 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5890731A (ja) * | 1981-11-25 | 1983-05-30 | Sony Corp | 感光性高分子膜形成用プラズマ処理装置 |
JPS58122736A (ja) * | 1982-01-14 | 1983-07-21 | Nippon Telegr & Teleph Corp <Ntt> | 絶縁膜形成法 |
JPS6184836A (ja) * | 1984-10-02 | 1986-04-30 | Dainippon Screen Mfg Co Ltd | 薄膜形成方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS587058B2 (ja) | 1983-02-08 |