JPS5173880A - - Google Patents

Info

Publication number
JPS5173880A
JPS5173880A JP50137864A JP13786475A JPS5173880A JP S5173880 A JPS5173880 A JP S5173880A JP 50137864 A JP50137864 A JP 50137864A JP 13786475 A JP13786475 A JP 13786475A JP S5173880 A JPS5173880 A JP S5173880A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50137864A
Other languages
Japanese (ja)
Inventor
Waisu Heruman
Kurotsutsu Eruharuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of JPS5173880A publication Critical patent/JPS5173880A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/32Holograms used as optical elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Holo Graphy (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP50137864A 1974-11-19 1975-11-18 Pending JPS5173880A (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742454750 DE2454750C3 (de) 1974-11-19 1974-11-19 Verfahren und Anordnung zur Herstellung von Bildmustern für Masken integrierter Schaltkreise mittels aberrationsfreier Bildpunkte von Punkthologrammen

Publications (1)

Publication Number Publication Date
JPS5173880A true JPS5173880A (enExample) 1976-06-26

Family

ID=5931206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50137864A Pending JPS5173880A (enExample) 1974-11-19 1975-11-18

Country Status (4)

Country Link
JP (1) JPS5173880A (enExample)
DE (1) DE2454750C3 (enExample)
FR (1) FR2292244A1 (enExample)
GB (1) GB1532655A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3175124D1 (en) * 1981-11-04 1986-09-18 Deere John Noise suppression device for a combustion engine, especially for public-works and agricultural engines, and machines equipped with such a device
DE69432092D1 (de) * 1993-05-24 2003-03-13 Holtronic Technologies Plc Lon Vorrichtung und Verfahren zur Veränderung des Massstabs eines gedruckten Musters
GB2293459B (en) * 1994-09-22 1997-10-01 Holtronic Technologies Ltd Method for printing of a pattern of features

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1522525C3 (de) * 1965-12-06 1975-01-16 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen einer Photolackmaske

Also Published As

Publication number Publication date
DE2454750B2 (de) 1981-02-26
FR2292244A1 (fr) 1976-06-18
GB1532655A (en) 1978-11-15
DE2454750A1 (de) 1976-05-26
FR2292244B1 (enExample) 1979-10-12
DE2454750C3 (de) 1982-03-18

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