JPS5171597A - - Google Patents
Info
- Publication number
- JPS5171597A JPS5171597A JP49144521A JP14452174A JPS5171597A JP S5171597 A JPS5171597 A JP S5171597A JP 49144521 A JP49144521 A JP 49144521A JP 14452174 A JP14452174 A JP 14452174A JP S5171597 A JPS5171597 A JP S5171597A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Welding Or Cutting Using Electron Beams (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14452174A JPS5344795B2 (enrdf_load_stackoverflow) | 1974-12-18 | 1974-12-18 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14452174A JPS5344795B2 (enrdf_load_stackoverflow) | 1974-12-18 | 1974-12-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5171597A true JPS5171597A (enrdf_load_stackoverflow) | 1976-06-21 |
JPS5344795B2 JPS5344795B2 (enrdf_load_stackoverflow) | 1978-12-01 |
Family
ID=15364262
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14452174A Expired JPS5344795B2 (enrdf_load_stackoverflow) | 1974-12-18 | 1974-12-18 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5344795B2 (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5376758A (en) * | 1976-12-20 | 1978-07-07 | Nippon Telegr & Teleph Corp <Ntt> | Plasma etching method |
JPS54107875A (en) * | 1978-02-14 | 1979-08-24 | Toshiba Corp | Producing apparatus for activated gas |
JPS5553422A (en) * | 1978-10-16 | 1980-04-18 | Mitsubishi Electric Corp | Plasma reactor |
JPS56147438A (en) * | 1980-04-16 | 1981-11-16 | Fujitsu Ltd | Microplasma treatment apparatus |
JPS56155535A (en) * | 1980-05-02 | 1981-12-01 | Nippon Telegr & Teleph Corp <Ntt> | Film forming device utilizing plasma |
-
1974
- 1974-12-18 JP JP14452174A patent/JPS5344795B2/ja not_active Expired
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5376758A (en) * | 1976-12-20 | 1978-07-07 | Nippon Telegr & Teleph Corp <Ntt> | Plasma etching method |
JPS54107875A (en) * | 1978-02-14 | 1979-08-24 | Toshiba Corp | Producing apparatus for activated gas |
JPS5553422A (en) * | 1978-10-16 | 1980-04-18 | Mitsubishi Electric Corp | Plasma reactor |
JPS56147438A (en) * | 1980-04-16 | 1981-11-16 | Fujitsu Ltd | Microplasma treatment apparatus |
JPS56155535A (en) * | 1980-05-02 | 1981-12-01 | Nippon Telegr & Teleph Corp <Ntt> | Film forming device utilizing plasma |
Also Published As
Publication number | Publication date |
---|---|
JPS5344795B2 (enrdf_load_stackoverflow) | 1978-12-01 |