JPS515956A - - Google Patents
Info
- Publication number
- JPS515956A JPS515956A JP7581774A JP7581774A JPS515956A JP S515956 A JPS515956 A JP S515956A JP 7581774 A JP7581774 A JP 7581774A JP 7581774 A JP7581774 A JP 7581774A JP S515956 A JPS515956 A JP S515956A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/02—Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux
- C30B19/04—Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux the solvent being a component of the crystal composition
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02387—Group 13/15 materials
- H01L21/02395—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02455—Group 13/15 materials
- H01L21/02463—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02546—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02625—Liquid deposition using melted materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/084—Ion implantation of compound devices
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Led Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7581774A JPS5638054B2 (US08087162-20120103-C00010.png) | 1974-07-04 | 1974-07-04 | |
GB26997/75A GB1497457A (en) | 1974-07-04 | 1975-06-25 | Semiconductor-liquid phase epitaxial growth method and semiconductor device manufactured using the same |
US05/590,554 US4030949A (en) | 1974-07-04 | 1975-06-26 | Method of effecting liquid phase epitaxial growth of group III-V semiconductors |
NLAANVRAGE7507908,A NL172876C (nl) | 1974-07-04 | 1975-07-03 | Werkwijze voor het epitaxiaal vanuit de vloeibare fase laten groeien van gaas of alxga1-xas op een substraat. |
DE752529747A DE2529747C3 (de) | 1974-07-04 | 1975-07-03 | Verfahren zur Erzeugung von epitaktischen Aufwachsungen aus der flussigen Phase |
FR7520950A FR2277432A1 (fr) | 1974-07-04 | 1975-07-03 | Procede de croissance epitaxiale en phase liquide des semiconducteurs et dispositif a semiconducteur ainsi realise |
CA230,768A CA1041646A (en) | 1974-07-04 | 1975-07-04 | Semiconductor-liquid phase epitaxial growth method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7581774A JPS5638054B2 (US08087162-20120103-C00010.png) | 1974-07-04 | 1974-07-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS515956A true JPS515956A (US08087162-20120103-C00010.png) | 1976-01-19 |
JPS5638054B2 JPS5638054B2 (US08087162-20120103-C00010.png) | 1981-09-03 |
Family
ID=13587101
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7581774A Expired JPS5638054B2 (US08087162-20120103-C00010.png) | 1974-07-04 | 1974-07-04 |
Country Status (7)
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5623740A (en) * | 1979-08-06 | 1981-03-06 | Fujitsu Ltd | Multilayer liquid phase epitaxial growing method |
JPH0343779A (ja) * | 1989-06-29 | 1991-02-25 | Hughes Aircraft Co | 分散補償風防ホログラム虚像表示装置 |
JP2003068664A (ja) * | 2001-08-29 | 2003-03-07 | Shin Etsu Handotai Co Ltd | 液相成長装置及びそれを使用する液相成長方法 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5567130A (en) * | 1978-11-14 | 1980-05-21 | Mitsubishi Electric Corp | Method of manufacturing semiconductor crystal |
US4315832A (en) * | 1979-03-05 | 1982-02-16 | Hughes Aircraft Company | Process for increasing laser crystal fluorescence yield by controlled atmosphere processing |
JPS582294A (ja) * | 1981-06-29 | 1983-01-07 | Fujitsu Ltd | 気相成長方法 |
US5185288A (en) * | 1988-08-26 | 1993-02-09 | Hewlett-Packard Company | Epitaxial growth method |
JP2507888B2 (ja) * | 1988-11-19 | 1996-06-19 | 工業技術院長 | ヘテロ構造体の製造方法 |
US5338389A (en) * | 1990-01-19 | 1994-08-16 | Research Development Corporation Of Japan | Method of epitaxially growing compound crystal and doping method therein |
JPH08225968A (ja) * | 1995-02-01 | 1996-09-03 | Hewlett Packard Co <Hp> | 多成分系固体材料のエッチング方法 |
EP1926133A3 (en) * | 1996-11-20 | 2008-08-13 | NEC Electronics Corporation | A method for boron contamination reduction in IC fabrication |
RU2639263C1 (ru) * | 2016-09-15 | 2017-12-20 | Общество с ограниченной ответственностью "Ме Га Эпитех" | Способ получения многослойных гетероэпитаксиальных структур в системе AlGaAs методом жидкофазной эпитаксии |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4877765A (US08087162-20120103-C00010.png) * | 1972-01-18 | 1973-10-19 | ||
JPS4877766A (US08087162-20120103-C00010.png) * | 1972-01-19 | 1973-10-19 | ||
JPS4880276A (US08087162-20120103-C00010.png) * | 1972-01-28 | 1973-10-27 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3294600A (en) * | 1962-11-26 | 1966-12-27 | Nippon Electric Co | Method of manufacture of semiconductor elements |
JPS4921991B1 (US08087162-20120103-C00010.png) * | 1969-06-27 | 1974-06-05 | ||
FR2086578A5 (US08087162-20120103-C00010.png) * | 1970-04-02 | 1971-12-31 | Labo Electronique Physique | |
GB1273284A (en) * | 1970-10-13 | 1972-05-03 | Standard Telephones Cables Ltd | Improvements in or relating to injection lasers |
US3933538A (en) * | 1972-01-18 | 1976-01-20 | Sumitomo Electric Industries, Ltd. | Method and apparatus for production of liquid phase epitaxial layers of semiconductors |
-
1974
- 1974-07-04 JP JP7581774A patent/JPS5638054B2/ja not_active Expired
-
1975
- 1975-06-25 GB GB26997/75A patent/GB1497457A/en not_active Expired
- 1975-06-26 US US05/590,554 patent/US4030949A/en not_active Expired - Lifetime
- 1975-07-03 FR FR7520950A patent/FR2277432A1/fr active Granted
- 1975-07-03 DE DE752529747A patent/DE2529747C3/de not_active Expired
- 1975-07-03 NL NLAANVRAGE7507908,A patent/NL172876C/xx not_active IP Right Cessation
- 1975-07-04 CA CA230,768A patent/CA1041646A/en not_active Expired
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4877765A (US08087162-20120103-C00010.png) * | 1972-01-18 | 1973-10-19 | ||
JPS4877766A (US08087162-20120103-C00010.png) * | 1972-01-19 | 1973-10-19 | ||
JPS4880276A (US08087162-20120103-C00010.png) * | 1972-01-28 | 1973-10-27 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5623740A (en) * | 1979-08-06 | 1981-03-06 | Fujitsu Ltd | Multilayer liquid phase epitaxial growing method |
JPH0343779A (ja) * | 1989-06-29 | 1991-02-25 | Hughes Aircraft Co | 分散補償風防ホログラム虚像表示装置 |
JP2003068664A (ja) * | 2001-08-29 | 2003-03-07 | Shin Etsu Handotai Co Ltd | 液相成長装置及びそれを使用する液相成長方法 |
Also Published As
Publication number | Publication date |
---|---|
NL172876B (nl) | 1983-06-01 |
NL7507908A (nl) | 1976-01-06 |
FR2277432A1 (fr) | 1976-01-30 |
DE2529747B2 (de) | 1978-07-20 |
FR2277432B1 (US08087162-20120103-C00010.png) | 1978-03-17 |
DE2529747C3 (de) | 1979-03-08 |
US4030949A (en) | 1977-06-21 |
GB1497457A (en) | 1978-01-12 |
DE2529747A1 (de) | 1976-01-15 |
NL172876C (nl) | 1983-11-01 |
CA1041646A (en) | 1978-10-31 |
JPS5638054B2 (US08087162-20120103-C00010.png) | 1981-09-03 |