JPS5150391A - - Google Patents

Info

Publication number
JPS5150391A
JPS5150391A JP50103095A JP10309575A JPS5150391A JP S5150391 A JPS5150391 A JP S5150391A JP 50103095 A JP50103095 A JP 50103095A JP 10309575 A JP10309575 A JP 10309575A JP S5150391 A JPS5150391 A JP S5150391A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50103095A
Inventor
Barutsuinsukii Herumuuto
Harutoman Hainritsuhi
Rautenbatsuha Deiitaa
Oosuteruroo Rorufu
Geetoritsuhi Rutsutsu
Hairu Gyuntaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of JPS5150391A publication Critical patent/JPS5150391A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0478—Copolymers from unsaturated polyesters and low molecular monomers characterised by the monomers used
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/106—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyurethanes Or Polyureas (AREA)
JP50103095A 1974-08-28 1975-08-27 Pending JPS5150391A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2441148A DE2441148C2 (de) 1974-08-28 1974-08-28 Strahlungshärtbare Überzugsmasse

Publications (1)

Publication Number Publication Date
JPS5150391A true JPS5150391A (ja) 1976-05-01

Family

ID=5924256

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50103095A Pending JPS5150391A (ja) 1974-08-28 1975-08-27

Country Status (6)

Country Link
US (1) US4424314A (ja)
JP (1) JPS5150391A (ja)
DE (1) DE2441148C2 (ja)
FR (1) FR2283187A1 (ja)
GB (1) GB1511716A (ja)
NL (1) NL7510137A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59217717A (ja) * 1983-05-26 1984-12-07 Japan Atom Energy Res Inst 不飽和ポリエステル樹脂組成物から成るプロテクトフィルム用粘着剤又はプロテクト用粘着シート

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2730898C2 (de) * 1977-07-08 1986-01-16 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare Bindemittel
SU1038352A1 (ru) * 1978-09-22 1983-08-30 Предприятие П/Я Р-6875 Пигментированный лакокрасочный состав ультрафиолетового отверждени
US4189366A (en) * 1979-01-15 1980-02-19 Eastman Kodak Company Radiation curable compositions containing 5-halo-6-halomethyluracil derivatives as photoinitiators
IT1162770B (it) * 1979-08-10 1987-04-01 Anic Spa Metodo per ricoprire superfici varie e mezzi adatti allo scopo
US4436887A (en) 1981-11-12 1984-03-13 Bausch & Lomb Incorporated N-Vinyl lactam based biomedical devices
DE3332503A1 (de) * 1983-09-09 1985-03-28 Basf Ag, 6700 Ludwigshafen Magnetische aufzeichnungstraeger
DE3332504A1 (de) * 1983-09-09 1985-03-28 Basf Ag, 6700 Ludwigshafen Magnetische aufzeichnungstraeger
DE3418482A1 (de) * 1984-05-18 1985-11-21 Basf Ag, 6700 Ludwigshafen Magnetische aufzeichnungstraeger
US4954591A (en) * 1987-11-06 1990-09-04 Pilkington Visioncare Holdings, Inc. Abrasion resistant radiation curable coating for polycarbonate article
DE3803457A1 (de) * 1988-02-05 1989-08-17 Basf Ag Flaechenfoermiges lichtempfindliches aufzeichnungsmaterial
US5104692A (en) * 1990-04-20 1992-04-14 Pilkington Visioncare Holdings, Inc. Two-layer antireflective coating applied in solution
GB2264118B (en) † 1992-02-07 1996-01-10 Sericol Ltd Radiation-curable compositions
DE4321533A1 (de) * 1993-06-29 1995-01-12 Herberts Gmbh Bindemittel- und Überzugsmittelzusammensetzung, deren Herstellung und Verwendung
US5360882A (en) * 1994-02-04 1994-11-01 Isp Investments Inc. Eutectic compositions of divinyl imidazolidone and vinyl caprolactam
US5463110A (en) * 1994-05-20 1995-10-31 Air Products And Chemicals, Inc. Michael adducts of N-vinylformamide and acrylic and methacrylic esters
US5679738A (en) * 1994-05-20 1997-10-21 Air Products And Chemicals, Inc. Aqueous polymeric emulsions incorporating polymerized units of michael adducts of N-vinylformamide
US5672731A (en) * 1994-05-20 1997-09-30 Air Products And Chemicals, Inc. N-vinylformamide/alkyl acrylate Michael adducts
US5569725A (en) * 1994-10-14 1996-10-29 Air Products And Chemicals, Inc. N-vinyl-n-acyl urea resins
US5712411A (en) 1995-12-14 1998-01-27 Air Products And Chemicals, Inc. N-vinylformamidopropionates and process for their synthesis
US5728878A (en) * 1996-07-02 1998-03-17 Air Products And Chemicals, Inc. Functional N-vinylformamides
WO1998024824A1 (fr) * 1996-12-03 1998-06-11 Nippon Kayaku Kabushiki Kaisha Compositions de resine photosensible et articles
AU1697700A (en) * 1998-12-14 2000-07-03 Dsm N.V. Powder paint binder composition
US7431759B2 (en) * 2005-03-31 2008-10-07 Sloan Donald D High elongation vacuum formable digital ink
US7662224B2 (en) * 2005-03-31 2010-02-16 Sloan Donald D High elongation vacuum formable digital ink
US7427317B2 (en) * 2005-03-31 2008-09-23 Sloan Donald D High elongation vacuum formable digital ink
ITMI20060670A1 (it) * 2006-04-05 2007-10-06 Ivm S R L Vernice a base di resine poliestere polinsature priva di stirene
JP6654348B2 (ja) * 2015-02-05 2020-02-26 株式会社ブリヂストン 積層体及び導電性ローラ

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2049715C3 (de) * 1970-10-09 1978-06-22 Basf Farben + Fasern Ag, 2000 Hamburg Verfahren zur Herstellung von durch ionisierende Strahlung gehärteten Filmen und Überzügen
US4113593A (en) 1974-12-10 1978-09-12 Basf Aktiengesellschaft Benzophenone-containing photopolymerizable binders for printing inks and coating compositions

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59217717A (ja) * 1983-05-26 1984-12-07 Japan Atom Energy Res Inst 不飽和ポリエステル樹脂組成物から成るプロテクトフィルム用粘着剤又はプロテクト用粘着シート
JPH025767B2 (ja) * 1983-05-26 1990-02-05 Nippon Genshiryoku Kenkyusho

Also Published As

Publication number Publication date
NL7510137A (nl) 1976-03-02
US4424314A (en) 1984-01-03
DE2441148A1 (de) 1976-03-11
FR2283187A1 (fr) 1976-03-26
FR2283187B1 (ja) 1979-03-30
GB1511716A (en) 1978-05-24
DE2441148C2 (de) 1982-10-14

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