JPS5140462B2 - - Google Patents
Info
- Publication number
- JPS5140462B2 JPS5140462B2 JP50072769A JP7276975A JPS5140462B2 JP S5140462 B2 JPS5140462 B2 JP S5140462B2 JP 50072769 A JP50072769 A JP 50072769A JP 7276975 A JP7276975 A JP 7276975A JP S5140462 B2 JPS5140462 B2 JP S5140462B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/20—Polysulfones
- C08G75/205—Copolymers of sulfur dioxide with unsaturated organic compounds
- C08G75/22—Copolymers of sulfur dioxide with unsaturated aliphatic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US483589A US3898350A (en) | 1974-06-27 | 1974-06-27 | Terpolymers for electron beam positive resists |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5114327A JPS5114327A (cg-RX-API-DMAC10.html) | 1976-02-04 |
| JPS5140462B2 true JPS5140462B2 (cg-RX-API-DMAC10.html) | 1976-11-04 |
Family
ID=23920683
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50072769A Expired JPS5140462B2 (cg-RX-API-DMAC10.html) | 1974-06-27 | 1975-06-17 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3898350A (cg-RX-API-DMAC10.html) |
| JP (1) | JPS5140462B2 (cg-RX-API-DMAC10.html) |
| CA (1) | CA1041347A (cg-RX-API-DMAC10.html) |
| DE (1) | DE2528288A1 (cg-RX-API-DMAC10.html) |
| FR (1) | FR2276610A1 (cg-RX-API-DMAC10.html) |
| GB (1) | GB1500606A (cg-RX-API-DMAC10.html) |
| IT (1) | IT1038697B (cg-RX-API-DMAC10.html) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5423213Y2 (cg-RX-API-DMAC10.html) * | 1972-07-27 | 1979-08-10 | ||
| US4011351A (en) * | 1975-01-29 | 1977-03-08 | International Business Machines Corporation | Preparation of resist image with methacrylate polymers |
| US3964908A (en) * | 1975-09-22 | 1976-06-22 | International Business Machines Corporation | Positive resists containing dimethylglutarimide units |
| US4045318A (en) * | 1976-07-30 | 1977-08-30 | Rca Corporation | Method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer |
| JPS5342511U (cg-RX-API-DMAC10.html) * | 1976-09-17 | 1978-04-12 | ||
| US4262083A (en) * | 1979-09-18 | 1981-04-14 | Rca Corporation | Positive resist for electron beam and x-ray lithography and method of using same |
| US4262073A (en) * | 1979-11-23 | 1981-04-14 | Rca Corporation | Positive resist medium and method of employing same |
| US4341861A (en) * | 1980-12-23 | 1982-07-27 | Rca Corporation | Aqueous developable poly(olefin sulfone) terpolymers |
| US4393160A (en) * | 1980-12-23 | 1983-07-12 | Rca Corporation | Aqueous developable poly(olefin sulfone) terpolymers |
| US4355094A (en) * | 1981-03-16 | 1982-10-19 | Rca Corporation | Positive radiation sensitive resist terpolymers |
| US4405776A (en) * | 1981-03-16 | 1983-09-20 | Rca Corporation | Positive radiation sensitive resist terpolymer from omega alkynoic acid |
| US4397939A (en) * | 1981-12-14 | 1983-08-09 | Rca Corporation | Method of using a positive electron beam resist medium |
| US4398001A (en) * | 1982-03-22 | 1983-08-09 | International Business Machines Corporation | Terpolymer resist compositions |
| EP0157262B1 (en) * | 1984-03-19 | 1988-06-08 | Nippon Oil Co. Ltd. | Novel electron beam resist materials |
| US4657841A (en) * | 1985-10-28 | 1987-04-14 | Bell Communications Research, Inc. | Electron beam sensitive positive resist comprising the polymerization product of an ω-alkenyltrimethyl silane monomer with sulfur dioxide |
| EP0698825A1 (en) * | 1994-07-29 | 1996-02-28 | AT&T Corp. | An energy sensitive resist material and a process for device fabrication using the resist material |
| JPH11286549A (ja) * | 1998-02-05 | 1999-10-19 | Canon Inc | 感光性樹脂及び該感光性樹脂を用いたレジスト、該レジストを用いた露光装置及び露光方法及び該露光方法で得られた半導体装置 |
| JP2001106785A (ja) * | 1999-08-05 | 2001-04-17 | Canon Inc | 感光性樹脂及び該感光性樹脂を用いたレジスト組成物、該レジスト組成物を用いたパターン形成方法、該パターン形成方法により製造されるデバイス及び該感光性樹脂を有するレジストを用いた露光方法 |
| US7550249B2 (en) * | 2006-03-10 | 2009-06-23 | Az Electronic Materials Usa Corp. | Base soluble polymers for photoresist compositions |
| US7704670B2 (en) * | 2006-06-22 | 2010-04-27 | Az Electronic Materials Usa Corp. | High silicon-content thin film thermosets |
| US7759046B2 (en) * | 2006-12-20 | 2010-07-20 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| US8026040B2 (en) | 2007-02-20 | 2011-09-27 | Az Electronic Materials Usa Corp. | Silicone coating composition |
| WO2008104874A1 (en) * | 2007-02-26 | 2008-09-04 | Az Electronic Materials Usa Corp. | Process for making siloxane polymers |
| JP2010519398A (ja) | 2007-02-27 | 2010-06-03 | エイゼット・エレクトロニック・マテリアルズ・ユーエスエイ・コーポレイション | ケイ素に基づく反射防止膜用組成物 |
| MX2023010765A (es) * | 2021-03-15 | 2023-09-22 | Mitsubishi Chem Corp | Composicion monomerica, resina metacrilica, y metodo para producir resina metacrilica. |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3535137A (en) * | 1967-01-13 | 1970-10-20 | Ibm | Method of fabricating etch resistant masks |
| CA925469A (en) * | 1968-11-18 | 1973-05-01 | Harada Susumu | Process for producing polyaminesulfones |
-
1974
- 1974-06-27 US US483589A patent/US3898350A/en not_active Expired - Lifetime
-
1975
- 1975-04-11 CA CA224,581A patent/CA1041347A/en not_active Expired
- 1975-05-21 FR FR7516541A patent/FR2276610A1/fr active Granted
- 1975-05-21 GB GB21874/75A patent/GB1500606A/en not_active Expired
- 1975-06-05 IT IT24025/75A patent/IT1038697B/it active
- 1975-06-17 JP JP50072769A patent/JPS5140462B2/ja not_active Expired
- 1975-06-25 DE DE19752528288 patent/DE2528288A1/de not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| US3898350A (en) | 1975-08-05 |
| JPS5114327A (cg-RX-API-DMAC10.html) | 1976-02-04 |
| IT1038697B (it) | 1979-11-30 |
| DE2528288A1 (de) | 1976-01-08 |
| FR2276610A1 (fr) | 1976-01-23 |
| FR2276610B1 (cg-RX-API-DMAC10.html) | 1981-03-06 |
| GB1500606A (en) | 1978-02-08 |
| CA1041347A (en) | 1978-10-31 |