JPS5138578B2 - - Google Patents
Info
- Publication number
- JPS5138578B2 JPS5138578B2 JP47105931A JP10593172A JPS5138578B2 JP S5138578 B2 JPS5138578 B2 JP S5138578B2 JP 47105931 A JP47105931 A JP 47105931A JP 10593172 A JP10593172 A JP 10593172A JP S5138578 B2 JPS5138578 B2 JP S5138578B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
- H01J37/141—Electromagnetic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47105931A JPS5138578B2 (en) | 1972-10-23 | 1972-10-23 | |
| DE2302689A DE2302689A1 (en) | 1972-10-23 | 1973-01-19 | ELECTRON MICROSCOPE |
| US00327615A US3849647A (en) | 1972-10-23 | 1973-01-22 | Scanning electron microscope |
| GB472373A GB1422398A (en) | 1972-10-23 | 1973-01-30 | Scanning electron microscope |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47105931A JPS5138578B2 (en) | 1972-10-23 | 1972-10-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4964365A JPS4964365A (en) | 1974-06-21 |
| JPS5138578B2 true JPS5138578B2 (en) | 1976-10-22 |
Family
ID=14420585
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47105931A Expired JPS5138578B2 (en) | 1972-10-23 | 1972-10-23 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3849647A (en) |
| JP (1) | JPS5138578B2 (en) |
| DE (1) | DE2302689A1 (en) |
| GB (1) | GB1422398A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2652273C2 (en) * | 1976-11-12 | 1978-11-02 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Method for the pictorial representation of a diffraction image in a transmission scanning corpuscular beam microscope |
| NL175245C (en) * | 1977-05-26 | 1984-10-01 | Philips Nv | ELECTRON MICROSCOPE WITH AUXILIARY LENS AND ELECTROMAGNETIC LENS FOR THIS. |
| JPS6080655U (en) * | 1983-11-08 | 1985-06-04 | 日本電子株式会社 | Electron microscope shutter device |
| JP2917697B2 (en) * | 1992-09-17 | 1999-07-12 | 株式会社日立製作所 | Transmission electron microscope |
| ATE448561T1 (en) * | 2003-09-02 | 2009-11-15 | Nanomegas Sprl | METHOD FOR MEASURING DIFFRACTION PATTERNS USING A TRANSMISSION ELECTRON MICROSOPY TO DETERMINE THE CRYSTAL STRUCTURE AND DEVICE THEREFOR |
| WO2013037802A1 (en) * | 2011-09-12 | 2013-03-21 | Mapper Lithography Ip B.V. | Vacuum chamber with base plate |
| EP2899744A1 (en) * | 2014-01-24 | 2015-07-29 | Carl Zeiss Microscopy GmbH | Method for preparing and analyzing an object as well as particle beam device for performing the method |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2438971A (en) * | 1946-10-31 | 1948-04-06 | Rca Corp | Compound electron objective lens |
| NL265945A (en) * | 1960-06-18 | |||
| GB990239A (en) * | 1961-08-17 | 1965-04-28 | Christopher William Baisley Gr | Improvements in measuring systems for electron diffraction patterns |
| US3225192A (en) * | 1962-12-28 | 1965-12-21 | Hitachi Ltd | Apparatus for producing electron microscope and diffraction images separately and simultaneously on the image plane |
| US3370168A (en) * | 1964-01-14 | 1968-02-20 | Hitachi Ltd | Anode aperture plate for a television camera tube in an electron microscope comprising a stainless steel foil |
| DE1614126B1 (en) * | 1967-02-27 | 1970-11-19 | Max Planck Gesellschaft | Corpuscular beam microscope, in particular electron microscope, with a condenser lens formed by the front of an objective lens and a range diaphragm |
| US3502870A (en) * | 1967-07-05 | 1970-03-24 | Hitachi Ltd | Apparatus for simultaneously displaying a plurality of images of an object being analyzed in an electron beam device |
| DE1804199C3 (en) * | 1968-03-26 | 1975-12-18 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Corpuscular beam device for the optional imaging of a specimen or its diffraction diagram |
| GB1238889A (en) * | 1968-11-26 | 1971-07-14 |
-
1972
- 1972-10-23 JP JP47105931A patent/JPS5138578B2/ja not_active Expired
-
1973
- 1973-01-19 DE DE2302689A patent/DE2302689A1/en not_active Ceased
- 1973-01-22 US US00327615A patent/US3849647A/en not_active Expired - Lifetime
- 1973-01-30 GB GB472373A patent/GB1422398A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US3849647A (en) | 1974-11-19 |
| DE2302689A1 (en) | 1974-05-09 |
| DE2302689B2 (en) | 1979-02-08 |
| GB1422398A (en) | 1976-01-28 |
| JPS4964365A (en) | 1974-06-21 |