GB1422398A - Scanning electron microscope - Google Patents
Scanning electron microscopeInfo
- Publication number
- GB1422398A GB1422398A GB472373A GB472373A GB1422398A GB 1422398 A GB1422398 A GB 1422398A GB 472373 A GB472373 A GB 472373A GB 472373 A GB472373 A GB 472373A GB 1422398 A GB1422398 A GB 1422398A
- Authority
- GB
- United Kingdom
- Prior art keywords
- detector
- lens
- coil
- deflection
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000004907 flux Effects 0.000 abstract 3
- 125000006850 spacer group Chemical group 0.000 abstract 2
- 238000001000 micrograph Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 230000001360 synchronised effect Effects 0.000 abstract 1
- 238000011144 upstream manufacturing Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
- H01J37/141—Electromagnetic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
1422398 Electron microscopes NIHON DENSHI KK 30 Jan 1973 [23 Oct 1972] 4723/73 Heading H1D [Also in Division H4] A scanning electron microscope comprises condensers 2, 3, an objective lens system 4 including a coil and pole-pieces defining at least one gap, and wherein the magnetic flux intensity in the gap or gaps is sufficient to form a first apparent lens just upstream from the specimen plane and a second apparent lens just downstream of the specimen plane so that the beam crosses the axis at least twice after passing the specimen plane (Fig. 3, not shown), deflection means 6 comprising at least one deflection stage for deflecting the scanning beam through the front focal point of the first apparent lens such that the beam scans the specimen perpendicularly, detector means 12 for detecting the transmitted beam at the second or more crossing point, first display means 13 connected to detector 12 and synchronized with deflection means 6, and second display means (e.g. apertured fluorescent screen 8) for displaying the diffraction pattern so that both displays may be viewed simultaneously. The screen 8 may be observed through window 9, deflection coil 16, ensures the diffraction pattern spot passes through the aperture, or alternatively, detector 12 and aperture 11 may be moved mechanically. Electric or magnetic fields may change the diffraction pattern position w.r.t. detector 12. Objective lens as in Fig. 2 (not shown) includes polepieces (20), (21), non-magnetic spacer (22), crystalline specimen (23), and deflection coil (6) attached to polepiece (20). Fig. 4 (not shown) includes apparent lenses (4a), (4b), (4c) produced by strong field (24), (Fig. 3). Fig. 5 (not shown) includes two coil pairs (6a, 6b) to deflect the beam twice, thereby varying the angle at which the beam crosses axis 26 at the front focal point of lens (4a). Perpendicular incidence ensures outer beam parts (25b, 25c) are diffracted while the central part (25a) is not. The lens of Fig. 6 (not shown) includes additional polepiece (29) producing two gaps with a single flux path, while Fig. 7 (not shown) includes further yoke (31), coil (30), polepieces (32, 33) and spacer (34), producing two flux paths and two gaps. For a high upper gap field, the low gap enlarges the diffraction pattern, but if that field is insufficient it acts as lenses (4a, 4b), while the lower gap field is lens (4c). Fig. 8 (not shown) includes semiconductor detector (35) at the plane of the deffraction pattern to produce the scanning microscope image, second detector (36) with aperture plate (37), additional deflection coil (38), detector (36) signal being supplied to the brightness control grid of cathode-ray tube (39). Detector (36) and plate (37) may be scanned mechanically. Fig. 9 (not shown) includes image pick up tube (43) as detector with incorpoated deflector coil (44). Cathode-ray tube (39) displays the signal. Reference is also made to diffraction patterns formed on a photographic plate.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP47105931A JPS5138578B2 (en) | 1972-10-23 | 1972-10-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1422398A true GB1422398A (en) | 1976-01-28 |
Family
ID=14420585
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB472373A Expired GB1422398A (en) | 1972-10-23 | 1973-01-30 | Scanning electron microscope |
Country Status (4)
Country | Link |
---|---|
US (1) | US3849647A (en) |
JP (1) | JPS5138578B2 (en) |
DE (1) | DE2302689A1 (en) |
GB (1) | GB1422398A (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2652273C2 (en) * | 1976-11-12 | 1978-11-02 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Method for the pictorial representation of a diffraction image in a transmission scanning corpuscular beam microscope |
NL175245C (en) * | 1977-05-26 | 1984-10-01 | Philips Nv | ELECTRON MICROSCOPE WITH AUXILIARY LENS AND ELECTROMAGNETIC LENS FOR THIS. |
JPS6080655U (en) * | 1983-11-08 | 1985-06-04 | 日本電子株式会社 | Electron microscope shutter device |
JP2917697B2 (en) * | 1992-09-17 | 1999-07-12 | 株式会社日立製作所 | Transmission electron microscope |
US7601956B2 (en) * | 2003-09-02 | 2009-10-13 | Avilov Anatoly Sergeevich | Method for measuring diffraction patterns from a transmission electron microscopy to determine crystal structures and a device therefor |
US9939728B2 (en) * | 2011-09-12 | 2018-04-10 | Mapper Lithography Ip B.V. | Vacuum chamber with a thick aluminum base plate |
EP2899744A1 (en) * | 2014-01-24 | 2015-07-29 | Carl Zeiss Microscopy GmbH | Method for preparing and analyzing an object as well as particle beam device for performing the method |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2438971A (en) * | 1946-10-31 | 1948-04-06 | Rca Corp | Compound electron objective lens |
NL265945A (en) * | 1960-06-18 | |||
GB990239A (en) * | 1961-08-17 | 1965-04-28 | Christopher William Baisley Gr | Improvements in measuring systems for electron diffraction patterns |
US3225192A (en) * | 1962-12-28 | 1965-12-21 | Hitachi Ltd | Apparatus for producing electron microscope and diffraction images separately and simultaneously on the image plane |
US3370168A (en) * | 1964-01-14 | 1968-02-20 | Hitachi Ltd | Anode aperture plate for a television camera tube in an electron microscope comprising a stainless steel foil |
DE1614126B1 (en) * | 1967-02-27 | 1970-11-19 | Max Planck Gesellschaft | Corpuscular beam microscope, in particular electron microscope, with a condenser lens formed by the front of an objective lens and a range diaphragm |
US3502870A (en) * | 1967-07-05 | 1970-03-24 | Hitachi Ltd | Apparatus for simultaneously displaying a plurality of images of an object being analyzed in an electron beam device |
DE1804199C3 (en) * | 1968-03-26 | 1975-12-18 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Corpuscular beam device for the optional imaging of a specimen or its diffraction diagram |
GB1238889A (en) * | 1968-11-26 | 1971-07-14 |
-
1972
- 1972-10-23 JP JP47105931A patent/JPS5138578B2/ja not_active Expired
-
1973
- 1973-01-19 DE DE2302689A patent/DE2302689A1/en not_active Ceased
- 1973-01-22 US US00327615A patent/US3849647A/en not_active Expired - Lifetime
- 1973-01-30 GB GB472373A patent/GB1422398A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE2302689B2 (en) | 1979-02-08 |
JPS4964365A (en) | 1974-06-21 |
US3849647A (en) | 1974-11-19 |
JPS5138578B2 (en) | 1976-10-22 |
DE2302689A1 (en) | 1974-05-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PE20 | Patent expired after termination of 20 years |
Effective date: 19930128 |