JPS5136873A - - Google Patents
Info
- Publication number
- JPS5136873A JPS5136873A JP10806474A JP10806474A JPS5136873A JP S5136873 A JPS5136873 A JP S5136873A JP 10806474 A JP10806474 A JP 10806474A JP 10806474 A JP10806474 A JP 10806474A JP S5136873 A JPS5136873 A JP S5136873A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10806474A JPS541432B2 (enrdf_load_stackoverflow) | 1974-09-19 | 1974-09-19 | |
| US05/613,427 US4068018A (en) | 1974-09-19 | 1975-09-15 | Process for preparing a mask for use in manufacturing a semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10806474A JPS541432B2 (enrdf_load_stackoverflow) | 1974-09-19 | 1974-09-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5136873A true JPS5136873A (enrdf_load_stackoverflow) | 1976-03-27 |
| JPS541432B2 JPS541432B2 (enrdf_load_stackoverflow) | 1979-01-24 |
Family
ID=14474964
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10806474A Expired JPS541432B2 (enrdf_load_stackoverflow) | 1974-09-19 | 1974-09-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS541432B2 (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55127557A (en) * | 1979-03-24 | 1980-10-02 | Sanyo Electric Co Ltd | Photomask and production thereof |
| JPS5652751A (en) * | 1979-10-05 | 1981-05-12 | Dainippon Printing Co Ltd | Photomask correcting method |
| JPS5893052A (ja) * | 1981-11-30 | 1983-06-02 | Seiko Epson Corp | ホトマスク |
-
1974
- 1974-09-19 JP JP10806474A patent/JPS541432B2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55127557A (en) * | 1979-03-24 | 1980-10-02 | Sanyo Electric Co Ltd | Photomask and production thereof |
| JPS5652751A (en) * | 1979-10-05 | 1981-05-12 | Dainippon Printing Co Ltd | Photomask correcting method |
| JPS5893052A (ja) * | 1981-11-30 | 1983-06-02 | Seiko Epson Corp | ホトマスク |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS541432B2 (enrdf_load_stackoverflow) | 1979-01-24 |