JPS512375B2 - - Google Patents
Info
- Publication number
- JPS512375B2 JPS512375B2 JP4629473A JP4629473A JPS512375B2 JP S512375 B2 JPS512375 B2 JP S512375B2 JP 4629473 A JP4629473 A JP 4629473A JP 4629473 A JP4629473 A JP 4629473A JP S512375 B2 JPS512375 B2 JP S512375B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Electrophotography Using Other Than Carlson'S Method (AREA)
- Electron Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US24930872A | 1972-05-01 | 1972-05-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4942352A JPS4942352A (en:Method) | 1974-04-20 |
| JPS512375B2 true JPS512375B2 (en:Method) | 1976-01-26 |
Family
ID=22942915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4629473A Expired JPS512375B2 (en:Method) | 1972-05-01 | 1973-04-25 |
Country Status (8)
| Country | Link |
|---|---|
| JP (1) | JPS512375B2 (en:Method) |
| BE (1) | BE798860A (en:Method) |
| DE (1) | DE2321684C3 (en:Method) |
| FR (1) | FR2183020B1 (en:Method) |
| GB (1) | GB1403834A (en:Method) |
| IT (1) | IT980926B (en:Method) |
| NL (1) | NL154015B (en:Method) |
| SE (1) | SE391405B (en:Method) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1421805A (en) * | 1972-11-13 | 1976-01-21 | Ibm | Method of forming a positive resist |
| US3893127A (en) * | 1973-09-27 | 1975-07-01 | Rca Corp | Electron beam recording media |
| US4289845A (en) * | 1978-05-22 | 1981-09-15 | Bell Telephone Laboratories, Inc. | Fabrication based on radiation sensitive resists and related products |
| JPS59222928A (ja) * | 1983-06-02 | 1984-12-14 | Matsushita Electronics Corp | マスク製作方法 |
-
1973
- 1973-04-18 SE SE7305532A patent/SE391405B/xx unknown
- 1973-04-25 FR FR7314988A patent/FR2183020B1/fr not_active Expired
- 1973-04-25 JP JP4629473A patent/JPS512375B2/ja not_active Expired
- 1973-04-27 NL NL7305933A patent/NL154015B/xx not_active IP Right Cessation
- 1973-04-27 IT IT6819373A patent/IT980926B/it active
- 1973-04-27 BE BE130538A patent/BE798860A/xx not_active IP Right Cessation
- 1973-04-28 DE DE19732321684 patent/DE2321684C3/de not_active Expired
- 1973-04-30 GB GB2036473A patent/GB1403834A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| BE798860A (fr) | 1973-08-16 |
| SE391405B (sv) | 1977-02-14 |
| NL154015B (nl) | 1977-07-15 |
| IT980926B (it) | 1974-10-10 |
| DE2321684A1 (de) | 1973-11-15 |
| DE2321684C3 (de) | 1979-07-26 |
| GB1403834A (en) | 1975-08-28 |
| NL7305933A (en:Method) | 1973-11-05 |
| FR2183020B1 (en:Method) | 1976-11-12 |
| DE2321684B1 (de) | 1974-01-31 |
| JPS4942352A (en:Method) | 1974-04-20 |
| FR2183020A1 (en:Method) | 1973-12-14 |