JPS5116235B2 - - Google Patents

Info

Publication number
JPS5116235B2
JPS5116235B2 JP48025270A JP2527073A JPS5116235B2 JP S5116235 B2 JPS5116235 B2 JP S5116235B2 JP 48025270 A JP48025270 A JP 48025270A JP 2527073 A JP2527073 A JP 2527073A JP S5116235 B2 JPS5116235 B2 JP S5116235B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP48025270A
Other languages
Japanese (ja)
Other versions
JPS49113887A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP48025270A priority Critical patent/JPS5116235B2/ja
Priority to US440770A priority patent/US3923703A/en
Priority to FR7404859A priority patent/FR2219955B1/fr
Priority to NL7401941A priority patent/NL7401941A/xx
Priority to CA193,832A priority patent/CA1046683A/en
Priority to GB936274A priority patent/GB1404927A/en
Priority to DE2410066A priority patent/DE2410066A1/en
Priority to IT48932/74A priority patent/IT1004348B/en
Publication of JPS49113887A publication Critical patent/JPS49113887A/ja
Publication of JPS5116235B2 publication Critical patent/JPS5116235B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/331—Polymers modified by chemical after-treatment with organic compounds containing oxygen
    • C08G65/332—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof
    • C08G65/3324—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof cyclic
    • C08G65/3326—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof cyclic aromatic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/333—Polymers modified by chemical after-treatment with organic compounds containing nitrogen
    • C08G65/33396—Polymers modified by chemical after-treatment with organic compounds containing nitrogen having oxygen in addition to nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
JP48025270A 1973-03-03 1973-03-03 Expired JPS5116235B2 (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP48025270A JPS5116235B2 (en) 1973-03-03 1973-03-03
US440770A US3923703A (en) 1973-03-03 1974-02-08 Process for preparing photosensitive polymer
FR7404859A FR2219955B1 (en) 1973-03-03 1974-02-13
NL7401941A NL7401941A (en) 1973-03-03 1974-02-13
CA193,832A CA1046683A (en) 1973-03-03 1974-03-01 Process for preparing photosensitive polymer
GB936274A GB1404927A (en) 1973-03-03 1974-03-01 Photosensitive polymers
DE2410066A DE2410066A1 (en) 1973-03-03 1974-03-02 METHOD OF MANUFACTURING A PHOTO-SENSITIVE POLYMER
IT48932/74A IT1004348B (en) 1973-03-03 1974-03-04 PROCEDURE FOR THE PREPARATION OF A PHOTOSENSITIVE POLYMER

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48025270A JPS5116235B2 (en) 1973-03-03 1973-03-03

Publications (2)

Publication Number Publication Date
JPS49113887A JPS49113887A (en) 1974-10-30
JPS5116235B2 true JPS5116235B2 (en) 1976-05-22

Family

ID=12161322

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48025270A Expired JPS5116235B2 (en) 1973-03-03 1973-03-03

Country Status (8)

Country Link
US (1) US3923703A (en)
JP (1) JPS5116235B2 (en)
CA (1) CA1046683A (en)
DE (1) DE2410066A1 (en)
FR (1) FR2219955B1 (en)
GB (1) GB1404927A (en)
IT (1) IT1004348B (en)
NL (1) NL7401941A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5744144Y2 (en) * 1979-11-17 1982-09-29
JPS61150569U (en) * 1985-03-12 1986-09-17
JPS6317901Y2 (en) * 1985-04-26 1988-05-20

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4165418A (en) * 1971-04-15 1979-08-21 Imperial Chemical Industries Limited Paint manufacture
US4518473A (en) * 1981-08-06 1985-05-21 The Upjohn Company Compositions and process
US4446247A (en) * 1981-08-06 1984-05-01 The Upjohn Company Compositions and process
US4425208A (en) 1981-08-06 1984-01-10 The Upjohn Company Compositions and process
DE3227552A1 (en) * 1982-07-23 1984-01-26 Dynamit Nobel Ag, 5210 Troisdorf COPOLYMERISATE WITH ETHYLENICALLY UNSATURATED BASIC BLOCKS AND SEVERAL FUNCTIONAL GROUPS
JPS61201239A (en) * 1985-03-04 1986-09-05 Agency Of Ind Science & Technol Light information recording composition
US5824717A (en) * 1988-05-27 1998-10-20 Exxon Chemical Patents Inc. Peroxide and radiation curable compositions containing isobutylenene copolymers having acrylate functionality
JPH06504628A (en) * 1990-12-20 1994-05-26 エクソン・ケミカル・パテンツ・インク UV/EB curable butyl copolymers for lithography and anti-corrosion coating applications

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4929683B1 (en) * 1970-09-16 1974-08-06

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5744144Y2 (en) * 1979-11-17 1982-09-29
JPS61150569U (en) * 1985-03-12 1986-09-17
JPS6317901Y2 (en) * 1985-04-26 1988-05-20

Also Published As

Publication number Publication date
FR2219955B1 (en) 1976-10-08
NL7401941A (en) 1974-09-05
CA1046683A (en) 1979-01-16
FR2219955A1 (en) 1974-09-27
US3923703A (en) 1975-12-02
DE2410066A1 (en) 1974-09-19
JPS49113887A (en) 1974-10-30
IT1004348B (en) 1976-07-10
GB1404927A (en) 1975-09-03

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