JPS51151684A - Evaporating source for vacuum evaporation - Google Patents

Evaporating source for vacuum evaporation

Info

Publication number
JPS51151684A
JPS51151684A JP7570475A JP7570475A JPS51151684A JP S51151684 A JPS51151684 A JP S51151684A JP 7570475 A JP7570475 A JP 7570475A JP 7570475 A JP7570475 A JP 7570475A JP S51151684 A JPS51151684 A JP S51151684A
Authority
JP
Japan
Prior art keywords
evaporating
evaporating source
vacuum evaporation
source
substance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7570475A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5415007B2 (enExample
Inventor
Fukumatsu Sakagami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Xerox Co Ltd filed Critical Fuji Xerox Co Ltd
Priority to JP7570475A priority Critical patent/JPS51151684A/ja
Publication of JPS51151684A publication Critical patent/JPS51151684A/ja
Publication of JPS5415007B2 publication Critical patent/JPS5415007B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP7570475A 1975-06-23 1975-06-23 Evaporating source for vacuum evaporation Granted JPS51151684A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7570475A JPS51151684A (en) 1975-06-23 1975-06-23 Evaporating source for vacuum evaporation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7570475A JPS51151684A (en) 1975-06-23 1975-06-23 Evaporating source for vacuum evaporation

Publications (2)

Publication Number Publication Date
JPS51151684A true JPS51151684A (en) 1976-12-27
JPS5415007B2 JPS5415007B2 (enExample) 1979-06-12

Family

ID=13583863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7570475A Granted JPS51151684A (en) 1975-06-23 1975-06-23 Evaporating source for vacuum evaporation

Country Status (1)

Country Link
JP (1) JPS51151684A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5528334A (en) * 1978-08-16 1980-02-28 Matsushita Electric Ind Co Ltd Manufacturing apparatus for ultrafine particle
JPS6017071A (ja) * 1984-06-14 1985-01-28 Matsushita Electric Ind Co Ltd 蒸発源用容器
US5650122A (en) * 1986-10-31 1997-07-22 Pasteur Sanofi Diagnostics Automated patient sample analysis instrument having tubes and reaction wells washing apparatus
EP3170915A1 (en) * 2015-11-23 2017-05-24 United Technologies Corporation Crucible and feedstock for vapor deposition
US10661297B2 (en) 2015-11-23 2020-05-26 United Technologies Corporation Methods for vapor deposition

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5528334A (en) * 1978-08-16 1980-02-28 Matsushita Electric Ind Co Ltd Manufacturing apparatus for ultrafine particle
JPS6017071A (ja) * 1984-06-14 1985-01-28 Matsushita Electric Ind Co Ltd 蒸発源用容器
US5650122A (en) * 1986-10-31 1997-07-22 Pasteur Sanofi Diagnostics Automated patient sample analysis instrument having tubes and reaction wells washing apparatus
EP3170915A1 (en) * 2015-11-23 2017-05-24 United Technologies Corporation Crucible and feedstock for vapor deposition
US10661297B2 (en) 2015-11-23 2020-05-26 United Technologies Corporation Methods for vapor deposition

Also Published As

Publication number Publication date
JPS5415007B2 (enExample) 1979-06-12

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