JPS51149131A - Chemical or electrochemical treatment method and apparatus therefor - Google Patents

Chemical or electrochemical treatment method and apparatus therefor

Info

Publication number
JPS51149131A
JPS51149131A JP51052042A JP5204276A JPS51149131A JP S51149131 A JPS51149131 A JP S51149131A JP 51052042 A JP51052042 A JP 51052042A JP 5204276 A JP5204276 A JP 5204276A JP S51149131 A JPS51149131 A JP S51149131A
Authority
JP
Japan
Prior art keywords
chemical
treatment method
apparatus therefor
electrochemical treatment
electrochemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP51052042A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6125799B2 (da
Inventor
Tapio Korupi Teyuubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KAUKO YOHANESU KURUSHI
RARUSU EDOBIN ANDERUSON
YUUNO MATEIASU NIEMI
Original Assignee
KAUKO YOHANESU KURUSHI
RARUSU EDOBIN ANDERUSON
YUUNO MATEIASU NIEMI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KAUKO YOHANESU KURUSHI, RARUSU EDOBIN ANDERUSON, YUUNO MATEIASU NIEMI filed Critical KAUKO YOHANESU KURUSHI
Publication of JPS51149131A publication Critical patent/JPS51149131A/ja
Publication of JPS6125799B2 publication Critical patent/JPS6125799B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/004—Sealing devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/02—Heating or cooling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Hybrid Cells (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Chemically Coating (AREA)
JP51052042A 1975-05-07 1976-05-07 Chemical or electrochemical treatment method and apparatus therefor Granted JPS51149131A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI751337A FI53841C (fi) 1975-05-07 1975-05-07 Elektrolytisk ytbelaeggningsanordning

Publications (2)

Publication Number Publication Date
JPS51149131A true JPS51149131A (en) 1976-12-21
JPS6125799B2 JPS6125799B2 (da) 1986-06-17

Family

ID=8509187

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51052042A Granted JPS51149131A (en) 1975-05-07 1976-05-07 Chemical or electrochemical treatment method and apparatus therefor

Country Status (14)

Country Link
JP (1) JPS51149131A (da)
BE (1) BE841590A (da)
CA (1) CA1093012A (da)
CH (1) CH620247A5 (da)
DD (1) DD125995A5 (da)
DE (1) DE2619987A1 (da)
DK (1) DK151906C (da)
FI (1) FI53841C (da)
FR (1) FR2310425A1 (da)
GB (1) GB1551340A (da)
HK (1) HK97184A (da)
IT (1) IT1061259B (da)
NO (1) NO148193C (da)
SE (2) SE7512925L (da)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02236295A (ja) * 1989-03-07 1990-09-19 Nec Corp 電気メッキ方法
US7033463B1 (en) 1998-08-11 2006-04-25 Ebara Corporation Substrate plating method and apparatus

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2104918B (en) * 1981-08-19 1984-12-19 Inoue Japax Res Electrodepositing a metal on a conductive surface
JPH03505348A (ja) * 1988-11-24 1991-11-21 グラム，ゲルハルト ワークピースにおいて被覆部を積層および／または除去する装置
GB2324805A (en) * 1997-04-30 1998-11-04 Platt Electromeck Limited Electroplating
US20060091020A1 (en) * 2004-10-29 2006-05-04 Medtronic, Inc. Processes and systems for formation of high voltage, anodic oxide on a valve metal anode
ES2363566T5 (es) * 2008-10-22 2020-04-16 Macdermid Enthone Inc Procedimiento para la deposición galvánica de capas de cromo duro
ES2816180T3 (es) * 2018-02-26 2021-03-31 Cockerill Maintenance & Ingenierie Sa Instalación y método de tratamiento superficial localizado para piezas industriales

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR661883A (fr) * 1928-01-31 1929-07-31 Perfectionnements apportés aux électrolyseurs
FR976098A (fr) * 1942-04-09 1951-03-13 Condensateurs S A Soc Ind Des Cuve d'électrolyse
US2465747A (en) * 1945-04-30 1949-03-29 Rca Corp Apparatus for electroplating metal
BE563570A (da) * 1956-12-28
DE2106164A1 (en) * 1971-02-10 1972-08-24 Forstmann E Electro deposition cell - subdivided by permeable partition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02236295A (ja) * 1989-03-07 1990-09-19 Nec Corp 電気メッキ方法
US7033463B1 (en) 1998-08-11 2006-04-25 Ebara Corporation Substrate plating method and apparatus
KR100694562B1 (ko) * 1998-08-11 2007-03-13 가부시키가이샤 에바라 세이사꾸쇼 기판 도금방법 및 장치

Also Published As

Publication number Publication date
NO148193C (no) 1983-08-24
FR2310425B1 (da) 1980-08-29
BE841590A (fr) 1976-09-01
SE8506146D0 (sv) 1985-12-27
CH620247A5 (en) 1980-11-14
FI53841B (fi) 1978-05-02
SE8506146L (sv) 1985-12-27
FI751337A (da) 1976-11-08
DK151906B (da) 1988-01-11
HK97184A (en) 1984-12-21
FI53841C (fi) 1978-08-10
GB1551340A (en) 1979-08-30
NO148193B (no) 1983-05-16
FR2310425A1 (fr) 1976-12-03
SE7512925L (sv) 1976-11-08
DE2619987A1 (de) 1976-11-25
NO761570L (da) 1976-11-09
DD125995A5 (de) 1977-06-08
IT1061259B (it) 1983-02-28
CA1093012A (en) 1981-01-06
DK151906C (da) 1988-08-08
JPS6125799B2 (da) 1986-06-17
DK205176A (da) 1976-11-08

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