JPS51137800A - Process for producing radiation setting resin - Google Patents

Process for producing radiation setting resin

Info

Publication number
JPS51137800A
JPS51137800A JP51052028A JP5202876A JPS51137800A JP S51137800 A JPS51137800 A JP S51137800A JP 51052028 A JP51052028 A JP 51052028A JP 5202876 A JP5202876 A JP 5202876A JP S51137800 A JPS51137800 A JP S51137800A
Authority
JP
Japan
Prior art keywords
setting resin
producing radiation
radiation setting
producing
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP51052028A
Other languages
English (en)
Japanese (ja)
Inventor
Jiyosefu Najibaa Danieru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Chemical Co
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Publication of JPS51137800A publication Critical patent/JPS51137800A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • C08F299/028—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight photopolymerisable compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4292—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof together with monocarboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/922—Polyepoxide polymer having been reacted to yield terminal ethylenic unsaturation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP51052028A 1975-05-09 1976-05-07 Process for producing radiation setting resin Pending JPS51137800A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/575,881 US4111770A (en) 1975-05-09 1975-05-09 Radiation curable epoxy resin

Publications (1)

Publication Number Publication Date
JPS51137800A true JPS51137800A (en) 1976-11-27

Family

ID=24302070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51052028A Pending JPS51137800A (en) 1975-05-09 1976-05-07 Process for producing radiation setting resin

Country Status (9)

Country Link
US (1) US4111770A (US20100012521A1-20100121-C00001.png)
JP (1) JPS51137800A (US20100012521A1-20100121-C00001.png)
AU (1) AU512039B2 (US20100012521A1-20100121-C00001.png)
BR (1) BR7602799A (US20100012521A1-20100121-C00001.png)
CA (1) CA1089143A (US20100012521A1-20100121-C00001.png)
DE (1) DE2619669A1 (US20100012521A1-20100121-C00001.png)
FR (1) FR2310367A1 (US20100012521A1-20100121-C00001.png)
GB (1) GB1549653A (US20100012521A1-20100121-C00001.png)
NL (1) NL7604466A (US20100012521A1-20100121-C00001.png)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4242415A (en) * 1978-12-26 1980-12-30 Ici Americas Inc. In-mold coating compositions containing functional group terminated liquid polymers
JPS5632551A (en) * 1979-08-23 1981-04-02 Japan Atom Energy Res Inst Aqueous coating resin composition
US4419487A (en) * 1980-06-05 1983-12-06 The B. F. Goodrich Company Toughened polyester resins
US4522962A (en) * 1980-09-08 1985-06-11 Scm Corporation Epoxy modified emulsion polymers
US4360968A (en) * 1981-07-27 1982-11-30 Western Electric Company, Incorporated Method for reducing solder sticking on a printed wiring board
JPS59126425A (ja) * 1982-08-30 1984-07-21 Japan Atom Energy Res Inst 自己硬化性改質エポキシ樹脂組成物およびその水散体
US4514468A (en) * 1983-05-26 1985-04-30 Sprague Electric Company Electronic component with UV-cured coating
EP0302134A1 (en) * 1987-08-07 1989-02-08 The Dow Chemical Company Polymer-modified vinylized epoxy resins
JPS61258817A (ja) * 1985-05-14 1986-11-17 Showa Highpolymer Co Ltd 硬化可能な樹脂及びその製造方法
US5300380A (en) * 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
EP0255989B1 (de) * 1986-08-06 1990-11-22 Ciba-Geigy Ag Negativ-Photoresist auf Basis von Polyphenolen und Epoxidverbindungen oder Vinylethern
DE19524180A1 (de) * 1995-07-03 1997-01-09 Basf Ag Verfahren und Vorrichtung zur kontinuierlichen Herstellung von Polymeren
US5948920A (en) * 1996-12-11 1999-09-07 Elf Atochem North America, Inc. Epoxides from dicyclopentadiene--unsaturated oil copolymers
CN113278114B (zh) * 2021-05-21 2023-01-31 安徽科邦树脂科技有限公司 一种功能性环氧改性丙烯酸酯乳液及其制备方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3367992A (en) * 1964-06-05 1968-02-06 Dow Chemical Co 2-hydroxyalkyl acrylate and methacrylate dicarboxylic acid partial esters and the oxyalkylated derivatives thereof
US3843612A (en) * 1970-07-20 1974-10-22 Rohm & Haas Moldable and/or thermoformable acrylic polymers and processes for the production thereof
JPS4823557B1 (US20100012521A1-20100121-C00001.png) * 1970-09-14 1973-07-14
US3683045A (en) * 1970-12-02 1972-08-08 Walton Leon Baldwin Phenothiazine stabilized vinyl ester resins
US3905931A (en) * 1972-11-10 1975-09-16 American Can Co Water-based film laminating adhesive from poly(ethyl acrylate), poly(ethylene/acrylic acid) and 1,2-epoxy resin
US3892819A (en) * 1973-03-21 1975-07-01 Dow Chemical Co Impact resistant vinyl ester resin and process for making same
JPS5249831B2 (US20100012521A1-20100121-C00001.png) * 1973-11-27 1977-12-20
US3928491A (en) * 1973-12-26 1975-12-23 Youngstown Sheet And Tube Co Modified vinyl ester resin and pipe made therefrom
US3912773A (en) * 1974-07-22 1975-10-14 Rohm & Haas Casting resin system containing acrylic polymer in acrylic monomer, diepoxide, and polyethylenically unsaturated monomer
US3968181A (en) * 1975-03-17 1976-07-06 Shell Oil Company Modified acrylate resin

Also Published As

Publication number Publication date
NL7604466A (nl) 1976-11-11
US4111770A (en) 1978-09-05
CA1089143A (en) 1980-11-04
FR2310367A1 (fr) 1976-12-03
GB1549653A (en) 1979-08-08
DE2619669A1 (de) 1976-11-18
AU512039B2 (en) 1980-09-18
AU1361876A (en) 1977-11-10
DE2619669C2 (US20100012521A1-20100121-C00001.png) 1987-06-04
BR7602799A (pt) 1976-11-16
FR2310367B1 (US20100012521A1-20100121-C00001.png) 1981-04-30

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